Y98-61303-159 9904264在由低能量离子注入形成的 SiO<sub>2</sub>薄膜中 Sn 毫微晶体的单电子电荷=Single electron charging of Sn nanocrys-tals in thin SiO<sub>2</sub> film formed by low energy ion im...Y98-61303-159 9904264在由低能量离子注入形成的 SiO<sub>2</sub>薄膜中 Sn 毫微晶体的单电子电荷=Single electron charging of Sn nanocrys-tals in thin SiO<sub>2</sub> film formed by low energy ion implanta-tion[会,英]/Nakajima,A.& Futatsugi,T.展开更多
文摘Y98-61303-159 9904264在由低能量离子注入形成的 SiO<sub>2</sub>薄膜中 Sn 毫微晶体的单电子电荷=Single electron charging of Sn nanocrys-tals in thin SiO<sub>2</sub> film formed by low energy ion implanta-tion[会,英]/Nakajima,A.& Futatsugi,T.