用Silvaco的ATLAS软件模拟了栅场板参数对AlGaN/GaN HEMT中电场分布的影响。模拟结果表明,场板的加入改变了器件中电势的分布情况,降低了栅边缘处的电场峰值,改善了器件的击穿特性;场板长度(LFP,length of field plate)、场板与势垒层...用Silvaco的ATLAS软件模拟了栅场板参数对AlGaN/GaN HEMT中电场分布的影响。模拟结果表明,场板的加入改变了器件中电势的分布情况,降低了栅边缘处的电场峰值,改善了器件的击穿特性;场板长度(LFP,length of field plate)、场板与势垒层间的介质层厚度t等对电场的分布影响很大。随着LFP的增大、t的减小,栅边缘处的电场峰值Epeak1明显下降,对提高器件的耐压非常有利。通过对相同器件结构处于不同漏压下的情况进行模拟,发现当器件处于高压下时,场板的分压作用更加明显,说明场板结构更适合于制备用作电力开关器件的高击穿电压AlGaN/GaN HEMT。展开更多
WT8.BZ]A new quasi 2-dimensional analytical approach to predicting the ring voltage,edge peak fields and optimal spacing of the planar junction with a single floating field limiting ring structure has been proposed,ba...WT8.BZ]A new quasi 2-dimensional analytical approach to predicting the ring voltage,edge peak fields and optimal spacing of the planar junction with a single floating field limiting ring structure has been proposed,based on the cylindrical symmetric solution and the critical field concept.The effects of the spacing and reverse voltage on the ring junction voltage and edge peak field profiles have been analyzed.The optimal spacing and the maximum breakdown voltage of the structure have also been obtained.The analytical results are in excellent agreement with that obtained from the 2-D device simulator,MEDICI and the reported result,which proves the presented model valid.展开更多
The failure experiments of the P-LDMOS （lateral double diffused metal oxide semiconductor） demonstrate that the high peak electrical fields in the channel region of high-voltage P-LDMOS will reinforce the hot-carrie...The failure experiments of the P-LDMOS （lateral double diffused metal oxide semiconductor） demonstrate that the high peak electrical fields in the channel region of high-voltage P-LDMOS will reinforce the hot-carrier effect, which can greatly reduce the reliability of the P-LDMOS. The electrical field distribution and two field peaks along the channel surface are proposed by Tsuprem-4 and Medici. The reason of resulting in the two electrical field peaks is also discussed. Two ways of reducing the two field peaks, which are to increase the channel length and to reduce the channel concentration, are also presented. The experimental results show that the methods presented can effectively improve the gate breakdown voltage and greatly improve the reliability of the P-LDMOS.展开更多
Based on a new semi empirical analytical method, namely equivalent doping transformation, the breakdown voltage and the peak field of the epitaxial diffused punch through junction have been obtained. The basic prin...Based on a new semi empirical analytical method, namely equivalent doping transformation, the breakdown voltage and the peak field of the epitaxial diffused punch through junction have been obtained. The basic principle of this method is introduced and a set of breakdown voltage and peak field plots are provided for the optimum design of the low voltage power devices. It shows that the analytical results coincide with the previous numerical simulation well.展开更多
文摘用Silvaco的ATLAS软件模拟了栅场板参数对AlGaN/GaN HEMT中电场分布的影响。模拟结果表明,场板的加入改变了器件中电势的分布情况,降低了栅边缘处的电场峰值,改善了器件的击穿特性;场板长度(LFP,length of field plate)、场板与势垒层间的介质层厚度t等对电场的分布影响很大。随着LFP的增大、t的减小,栅边缘处的电场峰值Epeak1明显下降,对提高器件的耐压非常有利。通过对相同器件结构处于不同漏压下的情况进行模拟,发现当器件处于高压下时,场板的分压作用更加明显,说明场板结构更适合于制备用作电力开关器件的高击穿电压AlGaN/GaN HEMT。
文摘WT8.BZ]A new quasi 2-dimensional analytical approach to predicting the ring voltage,edge peak fields and optimal spacing of the planar junction with a single floating field limiting ring structure has been proposed,based on the cylindrical symmetric solution and the critical field concept.The effects of the spacing and reverse voltage on the ring junction voltage and edge peak field profiles have been analyzed.The optimal spacing and the maximum breakdown voltage of the structure have also been obtained.The analytical results are in excellent agreement with that obtained from the 2-D device simulator,MEDICI and the reported result,which proves the presented model valid.
基金The National High Technology Research and Deve-lopment Program of China (No.2004AA1Z1060)the Foundation ofGraduate Creative Program of Jiangsu (No.XM04-30)the Founda-tion of Excellent Doctoral Dissertation of Southeast University (No.YBJJ0413).
文摘The failure experiments of the P-LDMOS （lateral double diffused metal oxide semiconductor） demonstrate that the high peak electrical fields in the channel region of high-voltage P-LDMOS will reinforce the hot-carrier effect, which can greatly reduce the reliability of the P-LDMOS. The electrical field distribution and two field peaks along the channel surface are proposed by Tsuprem-4 and Medici. The reason of resulting in the two electrical field peaks is also discussed. Two ways of reducing the two field peaks, which are to increase the channel length and to reduce the channel concentration, are also presented. The experimental results show that the methods presented can effectively improve the gate breakdown voltage and greatly improve the reliability of the P-LDMOS.
文摘Based on a new semi empirical analytical method, namely equivalent doping transformation, the breakdown voltage and the peak field of the epitaxial diffused punch through junction have been obtained. The basic principle of this method is introduced and a set of breakdown voltage and peak field plots are provided for the optimum design of the low voltage power devices. It shows that the analytical results coincide with the previous numerical simulation well.
