Cu/HfOx/n^＋Si devices are fabricated to investigate the influence of technological parameters including film thickness and Ar/02 ratio on the resistive switching （RS） characteristics of HfOx films, in terms of swit...Cu/HfOx/n^＋Si devices are fabricated to investigate the influence of technological parameters including film thickness and Ar/02 ratio on the resistive switching （RS） characteristics of HfOx films, in terms of switch ratio, endurance properties, retention time and multilevel storage. It is revealed that the RS characteristics show strong dependence on technological parameters mainly by altering the defects （oxygen vacancies） in the film. The sample with thickness of 2Onto and Ar/O2 ratio of 12：3 exhibits the best RS behavior with the potential of multilevel storage. The conduction mechanism of all the films is interpreted based on the filamentary model.展开更多
In this work, a two-dimensional fluid model has been employed to study the characteristics of Ar/O2 radio frequency（RF） inductively coupled plasma discharges. The emphasis of this work has been put on the influence ...In this work, a two-dimensional fluid model has been employed to study the characteristics of Ar/O2 radio frequency（RF） inductively coupled plasma discharges. The emphasis of this work has been put on the influence of the external parameters（i.e., the RF power, the pressure, and the Ar/O2 gas ratio） on the plasma properties. The numerical results show that the RF power has a significant influence on the amplitude of the plasma density rather than on the spatial distribution.However, the pressure and the Ar/O2 gas ratio affect not only the amplitude of the plasma density, but also the spatial uniformity. Finally, the comparison between the simulation results and the experimental data has been made at different gas pressures and oxygen contents, and a good agreement has been achieved.展开更多
The technique of atmospheric pressure plasma is of value in textile industry.In this paper,argon(Ar)and argon/oxygen(Ar/O2)atmospheric pressure plasma were used to treat wool and ramie fibers.The structures and proper...The technique of atmospheric pressure plasma is of value in textile industry.In this paper,argon(Ar)and argon/oxygen(Ar/O2)atmospheric pressure plasma were used to treat wool and ramie fibers.The structures and properties of treated fibers were investigated by means of SEM,XPS,single fiber tensile tester and so on.The results proved that the effects of plasma treatments depended on structural characteristics of fibers to a great extent,besides conditions of plasma treatment.By atmospheric pressure plasma treatment,wool fiber had significant changes in morphology structure,surface chemical component,mechanic properties and dyeability,while ramie fiber just showed a little change.In additional,Ar/O2 plasma showed more effective action than argon.And at the beginning of treatment,plasma brought about remarkable effects,which did not increase with prolonging of treat time.展开更多
Deposition of TiO2 film from atmospheric pressure non- equilibrium Ar/O2/TiCl4 plasma was done to study the effect of discharge power during the film deposition process in this paper. TiO2 films with kinds of morpholo...Deposition of TiO2 film from atmospheric pressure non- equilibrium Ar/O2/TiCl4 plasma was done to study the effect of discharge power during the film deposition process in this paper. TiO2 films with kinds of morphologies and controlled crystallization were deposited from mixtures of TiCl4 and O2 on quartz substrate by one step process. Scanning electron microscope （SEM） and transmission electron microscope （TEM） were used to analyze the morphology and crystallization of the deposited TiO2 films. It was found that the discharge power played a key role in the morphology and crystallization of the deposited TiO2 film whether the flow of TiCl4was large or small. When the flow of TiCl4 was large, the deposited TiO2 film was amorphous particles at low discharge power and was multi-crystalline at high discharge power. When the flow of TiCl4 was small, the deposited TiO2 film became more compact and the crystallization was enhanced as the discharge power increased. The dependence of the discharge current and the applied voltage with the discharge power indicated that it was a glow discharge. The gas temperature which increases with the discharge power is one of the main causes that affect the morphology and crystallization of the deposited film.展开更多
Measurement of the oxygen dissociation fraction in RF low pressure oxygen/argon plasma using optical emission spectrometry is presented. The oxygen dissociation fraction and its evolutions as functions of operational ...Measurement of the oxygen dissociation fraction in RF low pressure oxygen/argon plasma using optical emission spectrometry is presented. The oxygen dissociation fraction and its evolutions as functions of operational parameters were determined using argon as the actinometer. At a pressure of 30 Pa, the oxygen dissociation fraction decreased from 13.4% to 9.5% as the input power increased from 10 W to 70 W. At an input power of 50 W, the oxygen dissociation fraction decreased from 12.3% to 7.7% when the gas pressure increased from 10 Pa to 40 Pa. The influences of operational parameters on the generation of atomic oxygen were also discussed.展开更多
基金Supported by the National Natural Science Foundation of China under Grant No 51202196the National Aerospace Science Foundation of China under Grant No 2013ZF53067+2 种基金the Natural Science Basic Research Plan in Shaanxi Province of China under Grant No 2014JQ6204the Fundamental Research Funds for the Central Universities under Grant No 3102014JCQ01032the 111 Project under Grant No B08040
文摘Cu/HfOx/n^＋Si devices are fabricated to investigate the influence of technological parameters including film thickness and Ar/02 ratio on the resistive switching （RS） characteristics of HfOx films, in terms of switch ratio, endurance properties, retention time and multilevel storage. It is revealed that the RS characteristics show strong dependence on technological parameters mainly by altering the defects （oxygen vacancies） in the film. The sample with thickness of 2Onto and Ar/O2 ratio of 12：3 exhibits the best RS behavior with the potential of multilevel storage. The conduction mechanism of all the films is interpreted based on the filamentary model.
基金The project was supported by the National Key Basic Research Program of China(973)(2012CB720100)National Natural Science Foundation of China(20973124)~~
基金Project supported by the National Science and Technology Major Project of the Ministry of Science and Technology of China(Grant No.2011ZX02403-001)the National Natural Science Foundation of China(Grant No.11205025)
文摘In this work, a two-dimensional fluid model has been employed to study the characteristics of Ar/O2 radio frequency（RF） inductively coupled plasma discharges. The emphasis of this work has been put on the influence of the external parameters（i.e., the RF power, the pressure, and the Ar/O2 gas ratio） on the plasma properties. The numerical results show that the RF power has a significant influence on the amplitude of the plasma density rather than on the spatial distribution.However, the pressure and the Ar/O2 gas ratio affect not only the amplitude of the plasma density, but also the spatial uniformity. Finally, the comparison between the simulation results and the experimental data has been made at different gas pressures and oxygen contents, and a good agreement has been achieved.
文摘The technique of atmospheric pressure plasma is of value in textile industry.In this paper,argon(Ar)and argon/oxygen(Ar/O2)atmospheric pressure plasma were used to treat wool and ramie fibers.The structures and properties of treated fibers were investigated by means of SEM,XPS,single fiber tensile tester and so on.The results proved that the effects of plasma treatments depended on structural characteristics of fibers to a great extent,besides conditions of plasma treatment.By atmospheric pressure plasma treatment,wool fiber had significant changes in morphology structure,surface chemical component,mechanic properties and dyeability,while ramie fiber just showed a little change.In additional,Ar/O2 plasma showed more effective action than argon.And at the beginning of treatment,plasma brought about remarkable effects,which did not increase with prolonging of treat time.
基金National Natural Science Foundations of China (No.10835004,No.10775031)Science and Technology Commission of Shanghai Municipality,China (No.10XD1400100)
文摘Deposition of TiO2 film from atmospheric pressure non- equilibrium Ar/O2/TiCl4 plasma was done to study the effect of discharge power during the film deposition process in this paper. TiO2 films with kinds of morphologies and controlled crystallization were deposited from mixtures of TiCl4 and O2 on quartz substrate by one step process. Scanning electron microscope （SEM） and transmission electron microscope （TEM） were used to analyze the morphology and crystallization of the deposited TiO2 films. It was found that the discharge power played a key role in the morphology and crystallization of the deposited TiO2 film whether the flow of TiCl4was large or small. When the flow of TiCl4 was large, the deposited TiO2 film was amorphous particles at low discharge power and was multi-crystalline at high discharge power. When the flow of TiCl4 was small, the deposited TiO2 film became more compact and the crystallization was enhanced as the discharge power increased. The dependence of the discharge current and the applied voltage with the discharge power indicated that it was a glow discharge. The gas temperature which increases with the discharge power is one of the main causes that affect the morphology and crystallization of the deposited film.
基金supported by the Beijing Municipal Education Commission of China(No.KM201010015005)Beijing Key Laboratory of Printing & Packaging Materials and Technology of Beijing Institute of Graphic Communication of China(No.KF201005)
文摘Measurement of the oxygen dissociation fraction in RF low pressure oxygen/argon plasma using optical emission spectrometry is presented. The oxygen dissociation fraction and its evolutions as functions of operational parameters were determined using argon as the actinometer. At a pressure of 30 Pa, the oxygen dissociation fraction decreased from 13.4% to 9.5% as the input power increased from 10 W to 70 W. At an input power of 50 W, the oxygen dissociation fraction decreased from 12.3% to 7.7% when the gas pressure increased from 10 Pa to 40 Pa. The influences of operational parameters on the generation of atomic oxygen were also discussed.
