NdTbCo/Cr amorphous films with high perpendicular magnetic anisotropy were prepared onto glass substrates by rf magnetron sputtering. The effects of Nd substitution on the magnetic and magneto-optical properties of Tb...NdTbCo/Cr amorphous films with high perpendicular magnetic anisotropy were prepared onto glass substrates by rf magnetron sputtering. The effects of Nd substitution on the magnetic and magneto-optical properties of TbCo/Cr films were investigated. It was found that partial Tb substitution by Nd would increase the saturation magnetization and the Kerr rotation angle, change the temperature dependence of magneto-optical characteristics. These results can be explained by the ferrimagnetic structure of the rare earth-transition metal alloy. When the magnetic layer composition was （Nd0.265Tb0.735）31Co69, a saturation magnetization of 247 emu/cm^3 and a coercivity of 3.8 kOe at room temperature could be obtained.展开更多
For high-power impulse magnetron sputtering(HIPIMS),the peak power applied to the target is of great importance for regulating the ionization degree of the metal target and ion/atom flux ratio.In this work,chromium(Cr...For high-power impulse magnetron sputtering(HIPIMS),the peak power applied to the target is of great importance for regulating the ionization degree of the metal target and ion/atom flux ratio.In this work,chromium(Cr)films were deposited on 316-L stainless steel substrates and silicon(100) wafers with different peak powers by HIPIMS.The relationship between peak target power and properties of Cr films was explored in detail.The resulting structure and mechanical properties of deposited Cr films were characterized by X-ray diffraction(XRD),transmission electron microscope(TEM),atomic force microscopy(AFM),indentation hardness and scratch tester.The results indicate that the ionization degree of metal target and ion/atom flux ratio increase with the increase in peak power but without the loss of deposition rate at the same time.At low ionization degree,the deposited Cr film has low compressive residual stress and low hardness but good adhesion strength.When the ionization degree of target metal increases with increasing peak power,Cr film exhibits finer size and smoother surface with improved hardness but decreased adhesion strength.展开更多
The thermal stability and separation characteristics of anti-sticking layers of Pt/Cr films are studied in this paper. Several types of adhesion layers were investigated： 10.0 nm Pt, 1.5 nm Cr ＋ 50.0 nm Pt, 2.5 nm ...The thermal stability and separation characteristics of anti-sticking layers of Pt/Cr films are studied in this paper. Several types of adhesion layers were investigated： 10.0 nm Pt, 1.5 nm Cr ＋ 50.0 nm Pt, 2.5 nm Cr ＋ 50.0 nm Pt and 3.5 nm Cr ＋ 50.0 nm Pt fabricated using direct current magnetron sputtering. The variation of layer thickness, roughness, crystallization and surface topography of Pt/Cr films were analyzed by grazing incidence X-ray reflectometry, large angle X-ray diffraction and optical profiler before and after heating. 2.5 nm Cr ＋ 50.0 nm Pt film exhibits the best thermal stability and separation characteristics according to the heating and hot slumping experiments. The film was also applied as an anti-sticking layer to optimize the maximum temperature of the hot slumping technique.展开更多
The effects of single surfactant hexadecylpyridinium bromide（HPB） and cetyltrimethylammonium bromide（CTAB） and the combination of HPB and CTAB on the Cr nanoparticle content in the Ni-Cr film prepared by codeposit...The effects of single surfactant hexadecylpyridinium bromide（HPB） and cetyltrimethylammonium bromide（CTAB） and the combination of HPB and CTAB on the Cr nanoparticle content in the Ni-Cr film prepared by codeposition were investigated. Single HPB/CTAB addition inhibited the oxidation and amorphous transformation of the Cr nanoparticles in the plating bath and effectively stabilized the Cr nanoparticles content at approximately 10 mass% as a function of time. Moreover, the combination of HPB and CTAB formed a cylindrical micelle structure on the Cr nanoparticle surface, which prompted the formation of a layer of NiCr2O4. As a result, the Cr nanoparticle content increased sharply to 20 mass%.展开更多
The CrN and Cr-Al-Si-N films were deposited on Si wafer and SUS 304 substrates by a hybrid coating system with high power impulse magnetron sputtering (HIPIMS) and a DC pulse sputtering using Cr and AlSi targets under...The CrN and Cr-Al-Si-N films were deposited on Si wafer and SUS 304 substrates by a hybrid coating system with high power impulse magnetron sputtering (HIPIMS) and a DC pulse sputtering using Cr and AlSi targets under N2/Ar atmosphere.By varying the sputtering current of the AlSi target in the range of 0-2.5 A,both the Al and Si contents in the films increased gradually from 0 to 19.1% and 11.1% (mole fraction),respectively.The influences of the AlSi cathode DC pulse current on the microstructure,phase constituents,mechanical properties,and oxidation behaviors of the Cr-Al-Si-N films were investigated systematically.The results indicate that the as-deposited Cr-Al-Si-N films possess the typical nanocomposite structure,namely the face centered cubic (Cr,Al)N nano-crystallites are embedded in the amorphous Si3N4 matrix.With increasing the Al and Si contents,the hardness of the film first increases from 20.8 GPa for the CrN film to the peak value of 29.4 GPa for the Cr0.23Al0.14Si0.07 N film,and then decreases gradually.In the meanwhile,the Cr0.23Al0.14Si0.07N film also possesses excellent high-temperature oxidation resistance that is much better than that of the CrN film at 900 or 1000 °C.展开更多
NiCr micron-resistor was designed and prepared by magnetron sputtering and lithography on the substrate of silicon with different powers. It is found that there exists a big gap in the TCR between the annealed group a...NiCr micron-resistor was designed and prepared by magnetron sputtering and lithography on the substrate of silicon with different powers. It is found that there exists a big gap in the TCR between the annealed group and the un-annealed group. A series of tests were made to figure out the reasons lying behind the gap in the TCR between the annealed group and the un-annealed group. UV reflection results show that there is no increase in the concentration of free electrons after annealing. However, the data obtained from XRD reveal that the annealing does not have an obvious influence on the strain of thin films, but really increases the grain size of thin films. Therefore, the grain boundary scattering plays a dominant role in explaining the obvious difference in the TCR. Finally through appropriate methods, a micron-resistor for heating-up with a low TCR value was obtained.展开更多
With the development of industry, much attention has been paid to lengthening the life span of bearings. As reported in this paper, we investigated the Cr/CrN compound films formed on the specimens of W9Cr4V2Mo bearin...With the development of industry, much attention has been paid to lengthening the life span of bearings. As reported in this paper, we investigated the Cr/CrN compound films formed on the specimens of W9Cr4V2Mo bearing steel by ion beam assisted deposition for improving the performance of bearing steels. The Vicker＇s microhardness, pin-on-disc, electrochemical measurement, XRD and SEM tests were used to characterize and analyze the treated samples. All results indicated that the mechanical properties of the treated samples were good, with the microhardness greater than that of the uncoated specimen, and the wear resistance, the passivity and pitting corrosion resistance increased considerably, the films possessed alternate Cr and CrN compound phases and produced different effects on the improvement of the performance of W9Cr4V2Mo bearing steels with different composing phases.展开更多
The thin films of pure Cu and Cu-2.18%Cr(mole fraction,%) were deposited on Si(100) substrates. Then the samples were vacuum-annealed at 573-773 K to investigate the effect of Cr on the microstructural and electrical ...The thin films of pure Cu and Cu-2.18%Cr(mole fraction,%) were deposited on Si(100) substrates. Then the samples were vacuum-annealed at 573-773 K to investigate the effect of Cr on the microstructural and electrical characteristics of Cu/Si systems. The XRD results reveal that the annealed Cu(Cr) film has a strong(111) texture. The results of AFM and FESEM indicate that the Cu(Cr) films with insoluble Cr have compact surface morphology and fine columnar microstructure. Upon annealing,most Cr segregates at the surface and interface. The residual insoluble Cr is enriched in amorphous structure between Cu grains and retards the crystallization of annealed Cu(Cr) films. As a result,the minimal annealing resistivity of the Cu-2.18%Cr film is 2.76 μΩ·cm at 773 K,which approaches to 2.55 μΩ·cm of the Cu film at 673 K. Significant changes in the microstructure and properties are obtained by adding Cr to Cu films after annealing.展开更多
Chrome-doped titanium oxide films were prepared by reactive magnetron sputtering method. The films deposited on glass slides at room temperature were investigated by atom force microscope, X-ray diffractometer, X-ray ...Chrome-doped titanium oxide films were prepared by reactive magnetron sputtering method. The films deposited on glass slides at room temperature were investigated by atom force microscope, X-ray diffractometer, X-ray photoelectron spectroscopy, UV-Vis spectrophotometer, the photoluminescence （PL） and ellipse polarization apparatus. The results indicate that TiO2-Cr film exists in the form of amorphous. The prepared films possess a band gap of less than 3.20 eV, and a new absorption peak. The films, irradiated for 5 h under UV light, exhibit excellent photocatalytic activities with the optimum decomposition rate at 98.5% for methylene blue. Consequently, the thickness threshold on these films is 114 nm, at which the rate of photodegradation is 95% in 5 h. When the thickness is over 114 nm, the rate of photodegradation becomes stable. This result is completely different from that of crystalloid TiO2 thin film.展开更多
The effect of surface roughness of aluminum oxide (95%) substrate on the properties of Ni-Cr alloy thin film is studied.The thin films are prepared on the substrates with different roughness by using magnetron sputter...The effect of surface roughness of aluminum oxide (95%) substrate on the properties of Ni-Cr alloy thin film is studied.The thin films are prepared on the substrates with different roughness by using magnetron sputtering.The micro-structure,adhesive and electrical properties of the thin films were investigated by using scanning electron microscopy,scratch method and four-probe method.The burst voltage and current of the thin film transducers with different substrates were measured according to D-optimization method.The results show that the particle size,structural defect,resistivity and adhesion strength of the thin film increase with the increase of the substrate roughness.The difference among the burst time of the samples with difference substrate roughness gradually decreases with the increase of stimulation amount.The burst time is approximate to 20 μs in the charging voltage of 37 V.展开更多
基金the Major Project of National Natural Science Foundation of China(No.60490290)the National Natural Science Foundation of China(No.60571010)
文摘NdTbCo/Cr amorphous films with high perpendicular magnetic anisotropy were prepared onto glass substrates by rf magnetron sputtering. The effects of Nd substitution on the magnetic and magneto-optical properties of TbCo/Cr films were investigated. It was found that partial Tb substitution by Nd would increase the saturation magnetization and the Kerr rotation angle, change the temperature dependence of magneto-optical characteristics. These results can be explained by the ferrimagnetic structure of the rare earth-transition metal alloy. When the magnetic layer composition was （Nd0.265Tb0.735）31Co69, a saturation magnetization of 247 emu/cm^3 and a coercivity of 3.8 kOe at room temperature could be obtained.
基金financially supported by Joint Fund of National Natural Science Foundation of China and China Academy of Engineering Physics (No.U1330113)the National Natural Science Foundation of China (No.31300787)the Overseas Famous Teacher Program of Chinese Education Ministry (No. MS2010XNJT070)。
文摘For high-power impulse magnetron sputtering(HIPIMS),the peak power applied to the target is of great importance for regulating the ionization degree of the metal target and ion/atom flux ratio.In this work,chromium(Cr)films were deposited on 316-L stainless steel substrates and silicon(100) wafers with different peak powers by HIPIMS.The relationship between peak target power and properties of Cr films was explored in detail.The resulting structure and mechanical properties of deposited Cr films were characterized by X-ray diffraction(XRD),transmission electron microscope(TEM),atomic force microscopy(AFM),indentation hardness and scratch tester.The results indicate that the ionization degree of metal target and ion/atom flux ratio increase with the increase in peak power but without the loss of deposition rate at the same time.At low ionization degree,the deposited Cr film has low compressive residual stress and low hardness but good adhesion strength.When the ionization degree of target metal increases with increasing peak power,Cr film exhibits finer size and smoother surface with improved hardness but decreased adhesion strength.
文摘The thermal stability and separation characteristics of anti-sticking layers of Pt/Cr films are studied in this paper. Several types of adhesion layers were investigated： 10.0 nm Pt, 1.5 nm Cr ＋ 50.0 nm Pt, 2.5 nm Cr ＋ 50.0 nm Pt and 3.5 nm Cr ＋ 50.0 nm Pt fabricated using direct current magnetron sputtering. The variation of layer thickness, roughness, crystallization and surface topography of Pt/Cr films were analyzed by grazing incidence X-ray reflectometry, large angle X-ray diffraction and optical profiler before and after heating. 2.5 nm Cr ＋ 50.0 nm Pt film exhibits the best thermal stability and separation characteristics according to the heating and hot slumping experiments. The film was also applied as an anti-sticking layer to optimize the maximum temperature of the hot slumping technique.
文摘The effects of single surfactant hexadecylpyridinium bromide（HPB） and cetyltrimethylammonium bromide（CTAB） and the combination of HPB and CTAB on the Cr nanoparticle content in the Ni-Cr film prepared by codeposition were investigated. Single HPB/CTAB addition inhibited the oxidation and amorphous transformation of the Cr nanoparticles in the plating bath and effectively stabilized the Cr nanoparticles content at approximately 10 mass% as a function of time. Moreover, the combination of HPB and CTAB formed a cylindrical micelle structure on the Cr nanoparticle surface, which prompted the formation of a layer of NiCr2O4. As a result, the Cr nanoparticle content increased sharply to 20 mass%.
基金supported by a 2-Year Research Grant of Pusan National University,Korea
文摘The CrN and Cr-Al-Si-N films were deposited on Si wafer and SUS 304 substrates by a hybrid coating system with high power impulse magnetron sputtering (HIPIMS) and a DC pulse sputtering using Cr and AlSi targets under N2/Ar atmosphere.By varying the sputtering current of the AlSi target in the range of 0-2.5 A,both the Al and Si contents in the films increased gradually from 0 to 19.1% and 11.1% (mole fraction),respectively.The influences of the AlSi cathode DC pulse current on the microstructure,phase constituents,mechanical properties,and oxidation behaviors of the Cr-Al-Si-N films were investigated systematically.The results indicate that the as-deposited Cr-Al-Si-N films possess the typical nanocomposite structure,namely the face centered cubic (Cr,Al)N nano-crystallites are embedded in the amorphous Si3N4 matrix.With increasing the Al and Si contents,the hardness of the film first increases from 20.8 GPa for the CrN film to the peak value of 29.4 GPa for the Cr0.23Al0.14Si0.07 N film,and then decreases gradually.In the meanwhile,the Cr0.23Al0.14Si0.07N film also possesses excellent high-temperature oxidation resistance that is much better than that of the CrN film at 900 or 1000 °C.
文摘NiCr micron-resistor was designed and prepared by magnetron sputtering and lithography on the substrate of silicon with different powers. It is found that there exists a big gap in the TCR between the annealed group and the un-annealed group. A series of tests were made to figure out the reasons lying behind the gap in the TCR between the annealed group and the un-annealed group. UV reflection results show that there is no increase in the concentration of free electrons after annealing. However, the data obtained from XRD reveal that the annealing does not have an obvious influence on the strain of thin films, but really increases the grain size of thin films. Therefore, the grain boundary scattering plays a dominant role in explaining the obvious difference in the TCR. Finally through appropriate methods, a micron-resistor for heating-up with a low TCR value was obtained.
基金The project supported by National Natural Science Foundation of China (No. 90205001)
文摘With the development of industry, much attention has been paid to lengthening the life span of bearings. As reported in this paper, we investigated the Cr/CrN compound films formed on the specimens of W9Cr4V2Mo bearing steel by ion beam assisted deposition for improving the performance of bearing steels. The Vicker＇s microhardness, pin-on-disc, electrochemical measurement, XRD and SEM tests were used to characterize and analyze the treated samples. All results indicated that the mechanical properties of the treated samples were good, with the microhardness greater than that of the uncoated specimen, and the wear resistance, the passivity and pitting corrosion resistance increased considerably, the films possessed alternate Cr and CrN compound phases and produced different effects on the improvement of the performance of W9Cr4V2Mo bearing steels with different composing phases.
基金Project (0525) supported by the Shanghai Research Development Fund of Applied Materials
文摘The thin films of pure Cu and Cu-2.18%Cr(mole fraction,%) were deposited on Si(100) substrates. Then the samples were vacuum-annealed at 573-773 K to investigate the effect of Cr on the microstructural and electrical characteristics of Cu/Si systems. The XRD results reveal that the annealed Cu(Cr) film has a strong(111) texture. The results of AFM and FESEM indicate that the Cu(Cr) films with insoluble Cr have compact surface morphology and fine columnar microstructure. Upon annealing,most Cr segregates at the surface and interface. The residual insoluble Cr is enriched in amorphous structure between Cu grains and retards the crystallization of annealed Cu(Cr) films. As a result,the minimal annealing resistivity of the Cu-2.18%Cr film is 2.76 μΩ·cm at 773 K,which approaches to 2.55 μΩ·cm of the Cu film at 673 K. Significant changes in the microstructure and properties are obtained by adding Cr to Cu films after annealing.
文摘Chrome-doped titanium oxide films were prepared by reactive magnetron sputtering method. The films deposited on glass slides at room temperature were investigated by atom force microscope, X-ray diffractometer, X-ray photoelectron spectroscopy, UV-Vis spectrophotometer, the photoluminescence （PL） and ellipse polarization apparatus. The results indicate that TiO2-Cr film exists in the form of amorphous. The prepared films possess a band gap of less than 3.20 eV, and a new absorption peak. The films, irradiated for 5 h under UV light, exhibit excellent photocatalytic activities with the optimum decomposition rate at 98.5% for methylene blue. Consequently, the thickness threshold on these films is 114 nm, at which the rate of photodegradation is 95% in 5 h. When the thickness is over 114 nm, the rate of photodegradation becomes stable. This result is completely different from that of crystalloid TiO2 thin film.
文摘The effect of surface roughness of aluminum oxide (95%) substrate on the properties of Ni-Cr alloy thin film is studied.The thin films are prepared on the substrates with different roughness by using magnetron sputtering.The micro-structure,adhesive and electrical properties of the thin films were investigated by using scanning electron microscopy,scratch method and four-probe method.The burst voltage and current of the thin film transducers with different substrates were measured according to D-optimization method.The results show that the particle size,structural defect,resistivity and adhesion strength of the thin film increase with the increase of the substrate roughness.The difference among the burst time of the samples with difference substrate roughness gradually decreases with the increase of stimulation amount.The burst time is approximate to 20 μs in the charging voltage of 37 V.
