The population of the third(n=3)two-dimensional electron subband of InGaAs/InAlAs modulation-doped structures has been observed by means of Fourier transform photoluminescence(PL).Three well resolved PL peaks centred ...The population of the third(n=3)two-dimensional electron subband of InGaAs/InAlAs modulation-doped structures has been observed by means of Fourier transform photoluminescence(PL).Three well resolved PL peaks centred at 0.737,0.908,and 0.980eV are observed,which are attributed to the transitions from the lowest three electron subbands to the n=1 heavy-hole subband.The subband separations clearly exhibiting the features of the stepped quantum well with triangle and square potentials are consistent with numerical calculation.Thanks to the presence of Fermi cutoff,the population ratio of these three subbands can be estimated.Temperature and excitation-dependent luminescences are also analyzed.展开更多
A set of 100-nm gate-length In P-based high electron mobility transistors(HEMTs)were designed and fabricated with different gate offsets in gate recess.A novel technology was proposed for independent definition of gat...A set of 100-nm gate-length In P-based high electron mobility transistors(HEMTs)were designed and fabricated with different gate offsets in gate recess.A novel technology was proposed for independent definition of gate recess and T-shaped gate by electron beam lithography.DC and RF measurement was conducted.With the gate offset varying from drain side to source side,the maximum drain current(I_(ds,max))and transconductance(g_(m,max))increased.In the meantime,fTdecreased while f;increased,and the highest fmax of 1096 GHz was obtained.It can be explained by the increase of gate-source capacitance and the decrease of gate-drain capacitance and source resistance.Output conductance was also suppressed by gate offset toward source side.This provides simple and flexible device parameter selection for HEMTs of different usages.展开更多
An InGaAs/InAlAs five-layer asymmetric coupled quantum well (FACQW) is expected to show very large electrorefractive index change . n in a wideband transparency region. Band structures of the FACQW are analyzed with L...An InGaAs/InAlAs five-layer asymmetric coupled quantum well (FACQW) is expected to show very large electrorefractive index change . n in a wideband transparency region. Band structures of the FACQW are analyzed with Luttinger-Kohn Hamiltonian. The electrorefractive characteristics of the FACQW are discussed.展开更多
We fabricated a set of symmetric gate-recess devices with gate length of 70 nm.We kept the source-to-drain spacing(L_(SD))unchanged,and obtained a group of devices with gate-recess length(L_(recess))from 0.4µm to...We fabricated a set of symmetric gate-recess devices with gate length of 70 nm.We kept the source-to-drain spacing(L_(SD))unchanged,and obtained a group of devices with gate-recess length(L_(recess))from 0.4µm to 0.8µm through process improvement.In order to suppress the influence of the kink effect,we have done SiN_(X) passivation treatment.The maximum saturation current density(ID_(max))and maximum transconductance(g_(m,max))increase as L_(recess) decreases to 0.4µm.At this time,the device shows ID_(max)=749.6 mA/mm at V_(GS)=0.2 V,V_(DS)=1.5 V,and g_(m,max)=1111 mS/mm at V_(GS)=−0.35 V,V_(DS)=1.5 V.Meanwhile,as L_(recess) increases,it causes parasitic capacitance C_(gd) and g_(d) to decrease,making f_(max) drastically increases.When L_(recess)=0.8µm,the device shows f_(T)=188 GHz and f_(max)=1112 GHz.展开更多
基金Supported by the National Natural Science Foundation of China.
文摘The population of the third(n=3)two-dimensional electron subband of InGaAs/InAlAs modulation-doped structures has been observed by means of Fourier transform photoluminescence(PL).Three well resolved PL peaks centred at 0.737,0.908,and 0.980eV are observed,which are attributed to the transitions from the lowest three electron subbands to the n=1 heavy-hole subband.The subband separations clearly exhibiting the features of the stepped quantum well with triangle and square potentials are consistent with numerical calculation.Thanks to the presence of Fermi cutoff,the population ratio of these three subbands can be estimated.Temperature and excitation-dependent luminescences are also analyzed.
基金Project supported by the National Nature Science Foundation of China(Grant No.61434006)。
文摘A set of 100-nm gate-length In P-based high electron mobility transistors(HEMTs)were designed and fabricated with different gate offsets in gate recess.A novel technology was proposed for independent definition of gate recess and T-shaped gate by electron beam lithography.DC and RF measurement was conducted.With the gate offset varying from drain side to source side,the maximum drain current(I_(ds,max))and transconductance(g_(m,max))increased.In the meantime,fTdecreased while f;increased,and the highest fmax of 1096 GHz was obtained.It can be explained by the increase of gate-source capacitance and the decrease of gate-drain capacitance and source resistance.Output conductance was also suppressed by gate offset toward source side.This provides simple and flexible device parameter selection for HEMTs of different usages.
文摘An InGaAs/InAlAs five-layer asymmetric coupled quantum well (FACQW) is expected to show very large electrorefractive index change . n in a wideband transparency region. Band structures of the FACQW are analyzed with Luttinger-Kohn Hamiltonian. The electrorefractive characteristics of the FACQW are discussed.
基金Supported by Special Funds for Major State Basic Research under Project(2012CB619203,2013CB922301)National Natural Science Foundation of China(11174306,61290304)Innovation Program of Shanghai Institute of Technical Physics of the Chinese Academy of Sciences(Q-ZY-76)
基金the National Natural Science Foundation of China(Grant No.61434006).
文摘We fabricated a set of symmetric gate-recess devices with gate length of 70 nm.We kept the source-to-drain spacing(L_(SD))unchanged,and obtained a group of devices with gate-recess length(L_(recess))from 0.4µm to 0.8µm through process improvement.In order to suppress the influence of the kink effect,we have done SiN_(X) passivation treatment.The maximum saturation current density(ID_(max))and maximum transconductance(g_(m,max))increase as L_(recess) decreases to 0.4µm.At this time,the device shows ID_(max)=749.6 mA/mm at V_(GS)=0.2 V,V_(DS)=1.5 V,and g_(m,max)=1111 mS/mm at V_(GS)=−0.35 V,V_(DS)=1.5 V.Meanwhile,as L_(recess) increases,it causes parasitic capacitance C_(gd) and g_(d) to decrease,making f_(max) drastically increases.When L_(recess)=0.8µm,the device shows f_(T)=188 GHz and f_(max)=1112 GHz.
