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Single-electron transport through single and coupling dopant atoms in silicon junctionless nanowire transistor
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作者 Xiao-Di Zhang Wei-Hua Han +5 位作者 Wen Liu Xiao-Song Zhao Yang-Yan Guo Chong Yang Jun-Dong Chen Fu-Hua Yang 《Chinese Physics B》 SCIE EI CAS CSCD 2019年第12期315-319,共5页
We investigated single-electron tunneling through single and coupling dopant-induced quantum dots(QDs) in silicon junctionless nanowire transistor(JNT) by varying temperatures and bias voltages. We observed that two p... We investigated single-electron tunneling through single and coupling dopant-induced quantum dots(QDs) in silicon junctionless nanowire transistor(JNT) by varying temperatures and bias voltages. We observed that two possible charge states of the isolated QD confined in the axis of the initial narrowest channel are successively occupied as the temperature increases above 30 K. The resonance states of the double single-electron peaks emerge below the Hubbard band, at which several subpeaks are clearly observed respectively in the double oscillated current peaks due to the coupling of the QDs in the atomic scale channel. The electric field of bias voltage between the source and the drain could remarkably enhance the tunneling possibility of the single-electron current and the coupling strength of several dopant atoms. This finding demonstrates that silicon JNTs are the promising potential candidates to realize the single dopant atom transistors operating at room temperature. 展开更多
关键词 silicon nanowire transistor single electron tunneling dopant-induced quantum dots tunneling current spectroscopy
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Dopant atoms as quantum components in silicon nanoscale devices
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作者 Xiaosong Zhao Weihua Han +5 位作者 Hao Wang Liuhong Ma Xiaoming Li Wang Zhang Wei Yan Fuhua Yang 《Journal of Semiconductors》 EI CAS CSCD 2018年第6期43-50,共8页
Recent progress in nanoscale fabrication allows many fundamental studies of the few dopant atoms in various semiconductor nanostructures. Since the size of nanoscale devices has touched the limit of the nature, a sing... Recent progress in nanoscale fabrication allows many fundamental studies of the few dopant atoms in various semiconductor nanostructures. Since the size of nanoscale devices has touched the limit of the nature, a single dopant atom may dominate the performance of the device. Besides, the quantum computing considered as a future choice beyond Moore's law also utilizes dopant atoms as functional units. Therefore, the dopant atoms will play a significant role in the future novel nanoscale devices. This review focuses on the study of few dopant atoms as quantum components in silicon nanoscale device. The control of the number of dopant atoms and unique quantum transport characteristics induced by dopant atoms are presented. It can be predicted that the development of nanoelectronics based on dopant atoms will pave the way for new possibilities in quantum electronics. 展开更多
关键词 silicon nanoscale devices dopant atoms ionization energy dopant-induced quantum dots quantum transport
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