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Epitaxial growth triggered core-shell Pd@RuP nanorods for high-efficiency electrocatalytic hydrogen evolution
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作者 Jiaqian Ding Xian Jiang +9 位作者 Caikang Wang Zhuoya Zhu Chang Xu Yi Zhou Xuan Wang Qicheng Liu Zhenyuan Liu Yawen Tang Jun Lin Gengtao Fu 《Journal of Energy Chemistry》 SCIE EI CAS CSCD 2023年第11期510-517,I0011,共9页
Ru with Pt-like hydrogen bond strength,knockdown cost(~1/3 of Pt),and eximious stability is a competitive replacement for Pt-based catalysts towards the hydrogen evolution reaction(HER)in water splitting.The design of... Ru with Pt-like hydrogen bond strength,knockdown cost(~1/3 of Pt),and eximious stability is a competitive replacement for Pt-based catalysts towards the hydrogen evolution reaction(HER)in water splitting.The design of Ru-based catalysts via interface construction,crystal phase control,and specific light element doping to realize the impressive promotion of limited activity and stability remains challenging.Herein,we report the fabrication of Pd@RuP core-shell nanorods(NRs)via an epitaxial growth method,where ultrathin RuP shells extend the face-centered cubic(fcc)crystal structure and(111)plane of the Pd NRs core.Density functio nal theory results confirm that the core-s hell interface engineering and P doping synergistically accelerate electron transfer and moderate the d-band center to generate a suitable affinity for H*,thus optimizing HER kinetics.Compared with Pd@Ru NRs and Pt/C,the Pd@RuP NRs exhibit preferable electrocatalytic stability and superior activity with a low overpotential of 18 mV at 10 mA cm-2in the alkaline HER process.Furthermore,the integrated Pd@RuP//RuO2-based electrolyzer also displays a low operation potential of 1.42 V to acquire 10 mA cm-2,demonstrating great potential for practical water electrolysis.Our work presents an efficient avenue to design Ru-based electrocatalysts via epitaxial growth for extraordinary HER performance. 展开更多
关键词 Pd@RuP epitaxial growth Interface engineering Hydrogen evolution ELECTROCATALYST
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Epitaxial growth of trilayer graphene moiré superlattice
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作者 袁亚龙 褚衍邦 +14 位作者 胡成 田金朋 刘乐 吴帆帆 季怡汝 赵交交 黄智恒 昝晓洲 杜罗军 Kenji Watanabe Takashi Taniguchi 时东霞 史志文 杨威 张广宇 《Chinese Physics B》 SCIE EI CAS CSCD 2023年第7期510-514,共5页
The graphene-based moiré superlattice has been demonstrated as an exciting system for investigating strong correlation phenomenon. However, the fabrication of such moiré superlattice mainly relies on transfe... The graphene-based moiré superlattice has been demonstrated as an exciting system for investigating strong correlation phenomenon. However, the fabrication of such moiré superlattice mainly relies on transfer technology. Here, we report the epitaxial growth of trilayer graphene(TLG) moiré superlattice on hexagonal boron nitride(h BN) by a remote plasma-enhanced chemical vapor deposition method. The as-grown TLG/h BN shows a uniform moiré pattern with a period of ~ 15 nm by atomic force microscopy(AFM) imaging, which agrees with the lattice mismatch between graphene and h BN. By fabricating the device with both top and bottom gates, we observed a gate-tunable bandgap at charge neutral point(CNP) and displacement field tunable satellite resistance peaks at half and full fillings. The resistance peak at half-filling indicates a strong electron–electron correlation in our grown TLG/h BN superlattice. In addition, we observed quantum Hall states at Landau level filling factors ν = 6, 10, 14,..., indicating that our grown trilayer graphene has the ABC stacking order. Our work suggests that epitaxy provides an easy way to fabricate stable and reproducible two-dimensional strongly correlated electronic materials. 展开更多
关键词 epitaxial growth ABC-TLG/hBN moirésuperlattice electron correlations
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Preface to Special Issue on Towards High Performance Ga_(2)O_(3) Electronics: Epitaxial Growth and Power Devices(Ⅰ)
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作者 Genquan Han Shibing Long +2 位作者 Yuhao Zhang Yibo Wang Zhongming Wei 《Journal of Semiconductors》 EI CAS CSCD 2023年第6期4-6,共3页
There is currently great optimism within the electronics community that gallium oxide(Ga_(2)O_(3)) ultra-wide bandgap semiconductors have unprecedented prospects for eventually revolutionizing a rich variety of power ... There is currently great optimism within the electronics community that gallium oxide(Ga_(2)O_(3)) ultra-wide bandgap semiconductors have unprecedented prospects for eventually revolutionizing a rich variety of power electronic applications. Specially, benefiting from its ultra-high bandgap of around 4.8 eV, it is expected that the emerging Ga_(2)O_(3) technology would offer an exciting platform to deliver massively enhanced device performance for power electronics and even completely new applications. 展开更多
关键词 epitaxial growth and Power Devices Preface to Special Issue on Towards High Performance Ga_(2)O_(3)Electronics POWER
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Control of epitaxial growth at a-Si:H/c-Si heterointerface by the working pressure in PECVD
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作者 沈艳娇 陈剑辉 +7 位作者 杨静 陈兵兵 陈静伟 李峰 代秀红 刘海旭 许颖 麦耀华 《Chinese Physics B》 SCIE EI CAS CSCD 2016年第11期679-684,共6页
The epitaxial-Si(epi-Si) growth on the crystalline Si(c-Si) wafer could be tailored by the working pressure in plasmaenhanced chemical vapor deposition(PECVD).It has been systematically confirmed that the epitaxial gr... The epitaxial-Si(epi-Si) growth on the crystalline Si(c-Si) wafer could be tailored by the working pressure in plasmaenhanced chemical vapor deposition(PECVD).It has been systematically confirmed that the epitaxial growth at the hydrogenated amorphous silicon(a-Si:H)/c-Si interface is suppressed at high pressure(hp) and occurs at low pressure(1p).The hp a-Si:H,as a purely amorphous layer,is incorporated in the 1p-epi-Si/c-Si interface.We find that:(i) the epitaxial growth can also occur at a-Si:H coated c-Si wafer as long as this amorphous layer is thin enough;(ii) with the increase of the inserted hp layer thickness,lp epi-Si at the interface is suppressed,and the fraction of a-Si:H in the thin films increases and that of c-Si decreases,corresponding to the increasing minority carrier lifetime of the sample.Not only the epitaxial results,but also the quality of the thin films at hp also surpasses that at lp,leading to the longer minority carrier lifetime of the hp sample than the lp one although they have the same amorphous phase. 展开更多
关键词 hydrogenated amorphous silicon(a-Si:H) epitaxial growth INTERFACE plasma-enhanced chemical vapor deposition(PECVD)
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Epitaxial growth of antimony nanofilms on HOPG and thermal desorption to control the film thickness
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作者 邢淑雅 雷乐 +8 位作者 董皓宇 郭剑峰 曹飞跃 顾尚志 Sabir Hussain 庞斐 季威 许瑞 程志海 《Chinese Physics B》 SCIE EI CAS CSCD 2020年第9期164-171,共8页
Group-V elemental nanofilms were predicted to exhibit interesting physical properties such as nontrivial topological properties due to their strong spin-orbit coupling,the quantum confinement,and surface effect.It was... Group-V elemental nanofilms were predicted to exhibit interesting physical properties such as nontrivial topological properties due to their strong spin-orbit coupling,the quantum confinement,and surface effect.It was reported that the ultrathin Sb nanofilms can undergo a series of topological transitions as a function of the film thickness h:from a topological semimetal(h>7.8 nm)to a topological insulator(7.8 nm>h>2.7 nm),then a quantum spin Hall(QSH)phase(2.7 nm>h>1.0 nm)and a topological trivial semiconductor(h<1.0 nm).Here,we report a comprehensive investigation on the epitaxial growth of Sb nanofilms on highly oriented pyrolytic graphite(HOPG)substrate and the controllable thermal desorption to achieve their specific thickness.The morphology,thickness,atomic structure,and thermal-strain effect of the Sb nanofilms were characterized by a combination study of scanning electron microscopy(SEM),atomic force microscopy(AFM),and scanning tunneling microscopy(STM).The realization of Sb nanofilms with specific thickness paves the way for the further exploring their thickness-dependent topological phase transitions and exotic physical properties. 展开更多
关键词 epitaxial growth antimony films scanning tunneling microscope(STM) thermal desorption
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Fast High Order and Energy Dissipative Schemes with Variable Time Steps for Time-Fractional Molecular Beam Epitaxial Growth Model
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作者 Dianming Hou Zhonghua Qiao Tao Tang 《Annals of Applied Mathematics》 2023年第4期429-461,共33页
In this paper,we propose and analyze high order energy dissipative time-stepping schemes for time-fractional molecular beam epitaxial(MBE)growth model on the nonuniform mesh.More precisely,(2−α)-order,secondorder and... In this paper,we propose and analyze high order energy dissipative time-stepping schemes for time-fractional molecular beam epitaxial(MBE)growth model on the nonuniform mesh.More precisely,(2−α)-order,secondorder and(3−α)-order time-stepping schemes are developed for the timefractional MBE model based on the well known L1,L2-1σ,and L2 formulations in discretization of the time-fractional derivative,which are all proved to be unconditional energy dissipation in the sense of a modified discrete nonlocalenergy on the nonuniform mesh.In order to reduce the computational storage,we apply the sum of exponential technique to approximate the history part of the time-fractional derivative.Moreover,the scalar auxiliary variable(SAV)approach is introduced to deal with the nonlinear potential function and the history part of the fractional derivative.Furthermore,only first order method is used to discretize the introduced SAV equation,which will not affect high order accuracy of the unknown thin film height function by using some proper auxiliary variable functions V(ξ).To our knowledge,it is the first time to unconditionally establish the discrete nonlocal-energy dissipation law for the modified L1-,L2-1σ-,and L2-based high-order schemes on the nonuniform mesh,which is essentially important for such time-fractional MBE models with low regular solutions at initial time.Finally,a series of numerical experiments are carried out to verify the accuracy and efficiency of the proposed schemes. 展开更多
关键词 Time-fractional molecular beam epitaxial growth variable time-stepping scheme SAV approach energy stability
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Epitaxial growth and cracking of highly tough 7YSZ splats by thermal spray technology 被引量:14
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作者 Lin CHEN Guan-Jun YANG 《Journal of Advanced Ceramics》 SCIE CSCD 2018年第1期17-29,共13页
Thermally sprayed coatings are essentially layered materials and contain large numbers of lamellar pores. It is thus quite necessary to clarify the formation mechanism of lamellar pores which significantly influence c... Thermally sprayed coatings are essentially layered materials and contain large numbers of lamellar pores. It is thus quite necessary to clarify the formation mechanism of lamellar pores which significantly influence coating performances. In the present study, to elaborate the formation mechanism of lamellar pores, the yttria-stabilized zirconia(ZrO_2–7 wt% Y_2O_3, 7YSZ) splats, which have high fracture toughness and tetragonal phase stability, were employed. Interestingly, anomalous epitaxial growth occurred for all deposition temperatures in spite of the extremely high cooling rate,which clearly indicated chemical bonding and complete contact at splat/substrate interface before splat cooling. However, transverse spallation substantially occurred for all deposition temperatures in spite of the high fracture toughness of 7YSZ, which revealed that the lamellar pores were from transverse cracking/spallation due to the large stress during splat cooling. Additionally, fracture mechanics analysis was carried out, and it was found that the stress arose from the constraint effect of the shrinkage of the splat by locally heated substrate with the value about 1.97 GPa. This clearly demonstrated that the stress was indeed large enough to drive transverse cracking/spallation forming lamellar pores during splat cooling. All of these contribute to understanding the essential features of lamellar bonding and further tailoring the coating structures and performance. 展开更多
关键词 epitaxial growth crack patterns transverse cracking/spallation stress locally heated substrate
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Effect of substrate cooling on the epitaxial growth of Ni-based single-crystal superalloy fabricated by direct energy deposition 被引量:6
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作者 Jianwen Nie Chaoyue Chen +5 位作者 Longtao Liu Xiaodong Wang Ruixin Zhao Sansan Shuai Jiang Wang Zhongming Ren 《Journal of Materials Science & Technology》 SCIE EI CAS CSCD 2021年第3期148-161,共14页
The columnar-to-equiaxed transition(CET)or the formation of stray grains in the laser melting deposition is the least desirable for the repair of single-crystal blades.In this work,the forced water-cooling was conduct... The columnar-to-equiaxed transition(CET)or the formation of stray grains in the laser melting deposition is the least desirable for the repair of single-crystal blades.In this work,the forced water-cooling was conducted on a single-crystal Rene N5 substrate during the direct energy deposition(DED).The single track remelting,one-layer,two-layer,and eight-layer depositions were investigated to explore the grain growth mechanism.The solidification conditions of the DED process,including temperature field,temperature gradient,and solidification speed,were numerically analyzed by a finite element model.The single-track remelting results showed that the fraction of columnar crystal regions increases from55.81%in the air-cooled sample to 77.14%in the water-cooled one.The single-track deposits of one-and two-layer have the same trend,where the proportion of columnar crystal height was higher under the forced water-cooled condition.The electron backscattered diffraction(EBSD)grain-structure maps of an eight-layer deposit show that the epitaxial growth height increases from 1 mm in the air-cooling sample to 1.5 mm in the water-cooling one.The numerical results showed that the tempe rature gradient in[0011 direction was significantly increased by using forced water-cooling.In conclusion,the in-situ substrate cooling can become a potential method to promote epitaxial growth during DED via the influence on CET occurrence. 展开更多
关键词 Direct energy deposition epitaxial growth Columnar-to-equiaxed transition(CET) Temperature gradient
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Vapor-assisted epitaxial growth of porphyrin-based MOF thin film for nonlinear optical limiting 被引量:3
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作者 Yi-Hong Xiao Zhi-Gang Gu Jian Zhang 《Science China Chemistry》 SCIE EI CAS CSCD 2020年第8期1059-1065,共7页
Fabrication of metal-organic frameworks(MOFs)thin films has been an efficient way to expand their functionalities and applications.Here,we use the vapor-assisted deposition(VAD)method to epitaxially grow a porphyrin-b... Fabrication of metal-organic frameworks(MOFs)thin films has been an efficient way to expand their functionalities and applications.Here,we use the vapor-assisted deposition(VAD)method to epitaxially grow a porphyrin-based MOF PCN-222 film.That is,vapor source assists to deposit pre-treated precursor solution on quartz substrate to form a continuous PCN-222 film.Furthermore,utilizing the post-treated encapsulation of functional carbon-based nanoparticles,the carbon nanodots(CND)and Pt doped CND(Pt/CND)are well loaded into the pores of PCN-222 film,the size(~3.1 nm)of which is highly close to the pore size of the corresponding MOF(~3.7 nm).The Z-scan results reveal that PCN-222 film exhibits high reverse saturable absorption.In addition,encapsulation of carbon based nanodots into PCN-222 film could enhance the nonlinear optical limiting effect benefiting from the host-guest combination.This study serves to present both the available toolbox of thin film preparation and high potential for precise synthetic nanocomposite films in optical limiting devices. 展开更多
关键词 metal-organic framework epitaxial growth PORPHYRIN thin film nonlinear optical property
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Epitaxial growth of CsPbBr_(3)-PbS vertical and lateral heterostructures for visible to infrared broadband photodetection 被引量:1
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作者 Qingbo Liu Lihan Liang +2 位作者 Hongzhi Shen Dehui Li Hong Zhou 《Nano Research》 SCIE EI CSCD 2021年第11期3879-3885,共7页
Owing to their excellent optoelectronic properties, halide perovskite is very promising for photodetectors and other optoelectronic devices. Perovskite heterostructures are considered to be the key components for thes... Owing to their excellent optoelectronic properties, halide perovskite is very promising for photodetectors and other optoelectronic devices. Perovskite heterostructures are considered to be the key components for these devices. However, it is challenging to rationally synthesize those heterostructures. Here, we demonstrate that perovskite can be epitaxially grown on PbS by vapor transport, thereby creating an interesting CsPbBr_(3)-PbS heterostructure. Remarkably, photodetectors based on CsPbBr_(3)-PbS heterostructures exhibit visible to infrared broadband response with room temperature operation up to 2 μm. The room temperature detectivity higher than 1.0 × 10^(9) Jones was obtained in the 1.8- to 2-μm range. Furthermore, the p-n heterojunction exhibits a clear rectifying characteristic and enables detector to operate at zero-bias. Our study provides fundamentally contributes to establish the epitaxial growth perovskite heterostructures and demonstrate a materials platform for efficient perovskite-based optoelectronic devices. 展开更多
关键词 perovskites PBS HETEROSTRUCTURE epitaxial growth short-wavelength infrared
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Epitaxial growth of large area ZrS_(2)2D semiconductor films on sapphire for optoelectronics 被引量:1
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作者 Yan Tian Yong Cheng +7 位作者 Jidong Huang Siyu Zhang Hao Dong Gaokai Wang Jingren Chen Jinliang Wu Zhigang Yin Xingwang Zhang 《Nano Research》 SCIE EI CSCD 2022年第7期6628-6635,共8页
Recently,group-IVB semiconducting transition metal dichalcogenides(TMDs)of ZrS_(2) have attracted significant research interest due to its layered nature,moderate band gap,and extraordinary physical properties.Most de... Recently,group-IVB semiconducting transition metal dichalcogenides(TMDs)of ZrS_(2) have attracted significant research interest due to its layered nature,moderate band gap,and extraordinary physical properties.Most device applications require a deposition of high quality large-area uniform ZrS_(2) single crystalline films,which has not yet been achieved.In this work,for the first time,we demonstrate the epitaxial growth of high quality large-area uniform ZrS_(2) films on c-plane sapphire substrates by chemical vapor deposition.An atomically sharp interface is observed due to the supercell matching between ZrS_(2) and sapphire,and their epitaxial relationship is found to be ZrS_(2)(0001)[1010]||Al_(2)O_(3)(0001)[1120].The epitaxial ZrS_(2) film exhibits n-type semiconductor behavior with a room temperature mobility of 2.4 cm^(2)·V^(−1)·s^(−1),and the optical phonon is the dominant scattering mechanism at room temperature or above.Furthermore,the optoelectronic applications of ZrS_(2) films are demonstrated by fabricating photodetector devices.The ZrS_(2) photodetectors exhibit the excellent comprehensive performance,such as a light on/off ratio of 106 and a specific detectivity of 2.6×10^(12) Jones,which are the highest values compared with the photodetectors based on other group-IVB two-dimensional TMDs. 展开更多
关键词 ZrS_(2) epitaxial growth scattering mechanism PHOTODETECTORS transition metal dichalcogenides
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Review of a direct epitaxial approach to achieving micro-LEDs 被引量:1
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作者 蔡月飞 白洁 王涛 《Chinese Physics B》 SCIE EI CAS CSCD 2023年第1期22-29,共8页
There is a significantly increasing demand of developing augmented reality and virtual reality(AR and VR) devices,where micro-LEDs(μLEDs) with a dimension of ≤ 5 μm are the key elements. Typically, μLEDs are fabri... There is a significantly increasing demand of developing augmented reality and virtual reality(AR and VR) devices,where micro-LEDs(μLEDs) with a dimension of ≤ 5 μm are the key elements. Typically, μLEDs are fabricated by dry-etching technologies, unavoidably leading to a severe degradation in optical performance as a result of dry-etching induced damages. This becomes a particularly severe issue when the dimension of LEDs is ≤ 10 μm. In order to address the fundamental challenge, the Sheffield team has proposed and then developed a direct epitaxial approach to achievingμLEDs, where the dry-etching technologies for the formation of μLED mesas are not needed anymore. This paper provides a review on this technology and then demonstrates a number of monolithically integrated devices on a single chip using this technology. 展开更多
关键词 micro-LED epitaxial growth gallium nitride DISPLAY
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Novel two-dimensional transition metal chalcogenides created by epitaxial growth
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作者 Hong-Liang Lu Yu-Yang Zhang +1 位作者 Xiao Lin Hong-Jun Gao 《Science China(Physics,Mechanics & Astronomy)》 SCIE EI CAS CSCD 2021年第10期23-37,共15页
Two-dimensional(2D) materials have been a very important field in condensed matter physics, materials science, chemistry, and electronics. In a variety of 2D materials, transition metal chalcogenides are of particular... Two-dimensional(2D) materials have been a very important field in condensed matter physics, materials science, chemistry, and electronics. In a variety of 2D materials, transition metal chalcogenides are of particular interest due to their unique structures and rich properties. In this review, we introduce a series of 2D transition metal chalcogenides prepared by epitaxial growth. We show that not only 2D transition metal dichalcogenides can be grown, but also the transition metal chalcogenides that do not have bulk counterparts, and even patterned transition metal chalcogenides can be fabricated. We discuss the formation mechanisms of the novel structures, their interesting properties, and potential applications of these 2D transition metal chalcogenides. Finally, we give a summary and some perspectives on future studies. 展开更多
关键词 2D materials transition metal chalcogenides epitaxial growth
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Inverted List Kinetic Monte Carlo with Rejection Applied to Directed Self-Assembly of Epitaxial Growth
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作者 Michael A.Saum Tim P.Schulze Christian Ratsch 《Communications in Computational Physics》 SCIE 2009年第8期553-564,共12页
We study the growth of epitaxial thin films on pre-patterned substrates that influence the surface diffusion of subsequently deposited material using a kinetic Monte Carlo algorithm that combines the use of inverted l... We study the growth of epitaxial thin films on pre-patterned substrates that influence the surface diffusion of subsequently deposited material using a kinetic Monte Carlo algorithm that combines the use of inverted lists with rejection.The resulting algorithm is well adapted to systems with spatially heterogeneous hopping rates.To evaluate the algorithm’s performance we compare it with an efficient,binary-tree based algorithm.A key finding is that the relative performance of the inverted list algorithm improves with increasing system size. 展开更多
关键词 epitaxial growth kinetic Monte Carlo binary-tree search
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Alloy-buffer-controlled van der Waals epitaxial growth of aligned tellurene
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作者 Cong Wang Chao Xu +8 位作者 Xuyun Guo Ning Zhang Jianmin Yan Jiewei Chen Wei Yu Jing-Kai Qin Ye Zhu Lain-Jong Li Yang Chai 《Nano Research》 SCIE EI CSCD 2022年第6期5712-5718,共7页
Group-VI elemental two-dimensional(2D)materials(e.g.,tellurene(Te))have unique crystalline structures and extraordinarily physical properties.However,it still remains a great challenge to controllably grow 2D Te with ... Group-VI elemental two-dimensional(2D)materials(e.g.,tellurene(Te))have unique crystalline structures and extraordinarily physical properties.However,it still remains a great challenge to controllably grow 2D Te with good repeatability,uniformity,and highly aligned orientation using vapor growth method.Here,we design a Cu foil-assisted alloy-buffer-controlled growth method to epitaxially grow aligned single-crystalline 2D Te on an insulating mica substrate.The in-situ formation of Cu-Te alloy plays a key role on 2D Te growth,alleviating the spatial and temporal non-uniformity of precursor in conventional vapor deposition process.Through transmission electron microscopy(TEM)analysis combined with theoretical calculations,we unveil that the alignment growth of Te in the[110]direction is along the[600]direction of mica,owing to the small lattice mismatch(0.15%)and strong binding strength.This work presents a method to grow aligned high-quality 2D Te in a controllable manner. 展开更多
关键词 two-dimensional materials tellurene van der Waals interaction epitaxy growth aligned growth
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Development of in situ characterization techniques in molecular beam epitaxy
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作者 Chao Shen Wenkang Zhan +7 位作者 Manyang Li Zhenyu Sun Jian Tang Zhaofeng Wu Chi Xu Bo Xu Chao Zhao Zhanguo Wang 《Journal of Semiconductors》 EI CAS CSCD 2024年第3期9-32,共24页
Ex situ characterization techniques in molecular beam epitaxy(MBE)have inherent limitations,such as being prone to sample contamination and unstable surfaces during sample transfer from the MBE chamber.In recent years... Ex situ characterization techniques in molecular beam epitaxy(MBE)have inherent limitations,such as being prone to sample contamination and unstable surfaces during sample transfer from the MBE chamber.In recent years,the need for improved accuracy and reliability in measurement has driven the increasing adoption of in situ characterization techniques.These techniques,such as reflection high-energy electron diffraction,scanning tunneling microscopy,and X-ray photoelectron spectroscopy,allow direct observation of film growth processes in real time without exposing the sample to air,hence offering insights into the growth mechanisms of epitaxial films with controlled properties.By combining multiple in situ characterization techniques with MBE,researchers can better understand film growth processes,realizing novel materials with customized properties and extensive applications.This review aims to overview the benefits and achievements of in situ characterization techniques in MBE and their applications for material science research.In addition,through further analysis of these techniques regarding their challenges and potential solutions,particularly highlighting the assistance of machine learning to correlate in situ characterization with other material information,we hope to provide a guideline for future efforts in the development of novel monitoring and control schemes for MBE growth processes with improved material properties. 展开更多
关键词 epitaxial growth thin film in situ characterization molecular beam epitaxy(MBE)
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Interface-directed epitaxially growing nickle ensembles as efficient catalysts in dry reforming of methane 被引量:1
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作者 Ping Wang Song Wei +3 位作者 Shiyi Wang Ronghe Lin Xiaoling Mou Yunjie Ding 《Journal of Energy Chemistry》 SCIE EI CAS CSCD 2022年第3期502-513,I0014,共13页
Supported nickel catalysts are promising candidates for dry reforming of methane, but agglomeration of Ni^(0) and coke deposition hinder the industrial applications. Herein, we report a novel interface-directed synthe... Supported nickel catalysts are promising candidates for dry reforming of methane, but agglomeration of Ni^(0) and coke deposition hinder the industrial applications. Herein, we report a novel interface-directed synthetic approach to construct distinct metal ensembles by carefully tuning the compositions of the carriers. A Zr-Mn-Zn ternary oxide-supported Ni catalyst, together with the respective binary oxide-supported analogues, was synthesized by adopting a sequential co-precipitation and wetness impregnation method. Combined characterization techniques identify distinct catalyst models, including (i) conventional NiO nanoparticles with different sizes on Zr-Mn and Zr-Zn, and (ii) epitaxially growing NiO ensembles of a few nanometers thickness at the periphery of ZnO_(x) particles. These catalysts exhibit divergent responses in the catalytic testing, with the ternary oxide system significantly outperforming the binary analogues. The strong electronic interactions between Mn-Ni increase Ni dispersion and the activity while the stability is strengthened upon Zn addition. Both high activity, high selectivity, and remarkable stability are attained upon co-adding Mn and Zn. The interfaces between Ni and Zr-Mn-Zn rather than the physical contacts of individual oxide-supported analogues through mechanical mixing are keys for the outstanding performance. 展开更多
关键词 Methane dry reforming NICKEL INTERFACE epitaxial growth Structure-performance relationship
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Perpendicular magnetization and exchange bias in epitaxial NiO/[Ni/Pt]_(2)multilayers
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作者 黄林傲 王梅雨 +10 位作者 王鹏 袁源 刘若柏 刘天宇 卢羽 陈家瑞 魏陆军 张维 游彪 徐庆宇 杜军 《Chinese Physics B》 SCIE EI CAS CSCD 2022年第2期587-592,共6页
The realization of perpendicular magnetization and perpendicular exchange bias(PEB)in magnetic multilayers is important for the spintronic applications.NiO(t)/[Ni(4 nm)/Pt(1 nm)]_(2)multilayers with varying the NiO la... The realization of perpendicular magnetization and perpendicular exchange bias(PEB)in magnetic multilayers is important for the spintronic applications.NiO(t)/[Ni(4 nm)/Pt(1 nm)]_(2)multilayers with varying the NiO layer thickness t have been epitaxially deposited on SrTiO;(001)substrates.Perpendicular magnetization can be achieved when t<25 nm.Perpendicular magnetization originates from strong perpendicular magnetic anisotropy(PMA),mainly resulting from interfacial strain induced by the lattice mismatch between the Ni and Pt layers.The PMA energy constant decreases monotonically with increasing t,due to the weakening of Ni(001)orientation and a little degradation of the Ni–Pt interface.Furthermore,significant PEB can be observed though NiO layer has spin compensated(001)crystalline plane.The PEB field increases monotonically with increasing t,which is considered to result from the thickness dependent anisotropy of the NiO layer. 展开更多
关键词 perpendicular magnetic anisotropy perpendicular exchange bias epitaxial growth random field model
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The Growth and Microstructure of GaAs Embedded with Al Nanocrystals
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作者 王新明 CHEN Jie +4 位作者 ZENG Yong LI Jia ZHOU Minjie WU Weidong 阎大伟 《Journal of Wuhan University of Technology(Materials Science)》 SCIE EI CAS 2022年第6期1051-1055,共5页
The preparation and the microstructure of GaAs embedded with Al nanocrystals prepared by Laser molecular beam epitaxy were investigated.The microstructure of the sample was observed by transmission electron microscope... The preparation and the microstructure of GaAs embedded with Al nanocrystals prepared by Laser molecular beam epitaxy were investigated.The microstructure of the sample was observed by transmission electron microscope.The reflection high-energy electron diffraction(RHEED)pattern varied from the stripe pattern to the spot pattern at the beginning of the Al nanocrystals growth,and then the spot pattern tended to change to the stripe pattern.There was a large lattice mismatch between Al and GaAs substrate,and Al formed three-dimensional islands on the GaAs substrate,which led to the RHEED transformation into the spot pattern.Otherwise,the dislocations would be formed between the GaAs layer and Al islands due to the large lattice mismatch.Meanwhile,there was some polycrystal of GaAs around the Al islands. 展开更多
关键词 GaAs thin films epitaxial growth laser molecular beam epitaxy film growth mechanism
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Quartz Crystal Microbalances for Evaluating Gas Motion Differences between Dichlorosilane and Trichlorosilane in Ambient Hydrogen in a Slim Vertical Cold Wall Chemical Vapor Deposition Reactor 被引量:1
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作者 Mana Otani Toshinori Takahashi +3 位作者 Hitoshi Habuka Yuuki Ishida Shin-Ichi Ikeda Shiro Hara 《Advances in Chemical Engineering and Science》 2020年第3期190-200,共11页
A dichlorosilane gas and a trichlorosilane gas in ambient hydrogen were evaluated to show their different gas flow motions in a slim vertical cold wall chemical vapor deposition reactor for the Minimal Fab system. Thi... A dichlorosilane gas and a trichlorosilane gas in ambient hydrogen were evaluated to show their different gas flow motions in a slim vertical cold wall chemical vapor deposition reactor for the Minimal Fab system. This evaluation was performed for improving and controlling the film qualities and the productivities, using two quartz crystal microbalances (QCM) installed at the </span><span style="font-family:Verdana;">inlet and exhaust of the chamber by taking into account that the QCM frequency corresponds to the real time changes in the gas properties.</span><span style="font-family:Verdana;"> Typically, the time period approaching from the inlet to the exhaust was shorter for the trichlorosilane gas than that for the dichlorosilane gas. The trichlorosilane gas was shown to move like plug flow, while the dichlorosilane gas seemed to be well mixed in the entire chamber. 展开更多
关键词 Minimal Fab Chemical Vapor Deposition Reactor Quartz Crystal Microbalance Silicon epitaxial growth TRICHLOROSILANE DICHLOROSILANE
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