期刊文献+
共找到6篇文章
< 1 >
每页显示 20 50 100
用高分辨X射线衍射面扫描评估4H-SiC晶片结晶质量 被引量:3
1
作者 杨丹丹 王健 +4 位作者 孙科伟 张胜男 金雷 程红娟 郝建民 《半导体技术》 CAS 北大核心 2019年第6期477-482,共6页
介绍了高分辨X射线衍射(HRXRD)面扫描技术在评估4H-SiC抛光片整体结晶质量方面的应用。对4H-SiC抛光片整片及局部特定位置进行HRXRD摇摆曲线面扫描,并拟合摇摆曲线半高宽(FWHM)峰值得到的极图,观察4H-SiC抛光片表面的FWHM分布范围、分... 介绍了高分辨X射线衍射(HRXRD)面扫描技术在评估4H-SiC抛光片整体结晶质量方面的应用。对4H-SiC抛光片整片及局部特定位置进行HRXRD摇摆曲线面扫描,并拟合摇摆曲线半高宽(FWHM)峰值得到的极图,观察4H-SiC抛光片表面的FWHM分布范围、分布特点和多峰聚集区。结合表面缺陷测试仪和偏振光显微镜测试方法,对因螺旋生长产生的晶界分布聚集区以及边缘高应力晶界聚集区进行了表征。二者测试结果与HRXRD摇摆曲线面扫描的结果一致。对多片样品在不同区域使用不同测试方法得到的结果均验证了HRXRD摇摆曲线面扫描可以宏观识别晶畴界面聚集区,清楚辨别出位于晶片中心附近由于螺旋生长面交界形成的晶畴界面,以及位于晶片边缘、受生长热场影响晶粒畸变产生的高应力晶畴界面。 展开更多
关键词 4H-SiC单晶 高分辨X射线衍射(hrxrd) 面扫描 摇摆曲线半高宽(FWHM) 晶界
原文传递
Epitaxial growth of Ge_(1-x)Sn_x films with x up to 0.14 grown on Ge(00l) at low temperature
2
作者 陶平 黄磊 +2 位作者 Cheng H H 王焕华 吴小山 《Chinese Physics B》 SCIE EI CAS CSCD 2014年第8期591-594,共4页
We characterize the structures of Ge1-xSnx films with x up to 0.14 grown on Ge (001) by molecular-beam epitaxy at low temperature. The results show that Ge1-xSnx films are fully strained even at high Sn composition.... We characterize the structures of Ge1-xSnx films with x up to 0.14 grown on Ge (001) by molecular-beam epitaxy at low temperature. The results show that Ge1-xSnx films are fully strained even at high Sn composition. The in-plane lattice parameters remain exactly the same as that of the substrate. Depth sensitivity analysis of the lattice parameters indicates that the strains of the epitaxial films are all in homogeneity. The films are fully strained. Poisson ratios, the force constants for the bonds between Ge and Sn are estimated and discussed in the present paper. Raman results show Ge-Ge, Ge-Sn, Sn-Sn vibrational modes. The Sn-Sn bond aggregation may respond to the high quality of our films. The fully strained epitaxy films with high content of Sn may be useful in designing the high quality GeSn films. 展开更多
关键词 GeSn films high resolution x-ray diffraction fully-strained Raman measurements
原文传递
The role of defects association in structural and transport properties of the Ce_(1-x)(Nd_(0.74)Tm_(0.26))_xO_(2-x/2) system
3
作者 Cristina Artini Sabrina Presto +4 位作者 Massimo Viviani Sara Massardo Maria Maddalena Carnasciali Lara Gigli Marcella Pani 《Journal of Energy Chemistry》 SCIE EI CAS CSCD 2021年第9期494-502,共9页
An experimental investigation of the crystallographic,Raman and transport properties of the Ce_(1-x)(Nd_(0.74)Tm_(0.26))_xO_(2-x/2)(0.1≤x≤0.6) doped ceria system was performed with the aim of setting out correlation... An experimental investigation of the crystallographic,Raman and transport properties of the Ce_(1-x)(Nd_(0.74)Tm_(0.26))_xO_(2-x/2)(0.1≤x≤0.6) doped ceria system was performed with the aim of setting out correlations between structural features and ionic conductivity of the material.The chosen composition ensures that the average size of the Nd^(3+) and Tm^(3+) doping ions coincides with the one of Sm^(3+);even so,the studied system presents larger cell parameters and a wider compositional extent of the CeO_(2)-based solid solution than Sm-doped ceria.Moreover,the occurrence of two different activation energies to ionic conduction below and above ~750 K determines the existence of two distinct conduction regimes.The described experimental results agree with the formation below the threshold temperature of1 V_O2 Tm'_(Ce) trimers,which promote the incorporation of Nd'_(Ce) isolated defects into the CeO_(2)-based solid solution.In the high temperature range the dissociation of trimers induces the appearance of a lower activation energy;the extrapolation of its value at infinite dilution provides a result in good accordance with the expected binding energy of 1 V_ORE'_(Ce) dimers,pointing at their stability even in the high temperature conduction regime. 展开更多
关键词 Solid oxide fuel cells RE-doped ceria high resolution x-ray powder diffraction Rietveld refinement μ-Raman spectroscopy Impedance spectroscopy
下载PDF
X-ray reflectivity and atomic force microscopy studies of MOCVD grown AI_xGa_(1-x)N/GaN superlattice structures
4
作者 王元樟 李金钗 +3 位作者 李书平 陈航洋 刘达艺 康俊勇 《Journal of Semiconductors》 EI CAS CSCD 北大核心 2011年第4期48-51,共4页
The grazing incidence X-ray reflectivity(GIXR) technique and atomic force microscopy(AFM) were exploited to obtain an accurate evaluation of the surfaces and interfaces for metalorganic chemical vapor deposition grown... The grazing incidence X-ray reflectivity(GIXR) technique and atomic force microscopy(AFM) were exploited to obtain an accurate evaluation of the surfaces and interfaces for metalorganic chemical vapor deposition grown AlGaN/GaN superlattice structures.The X-ray diffraction results have been combined with reflectivity data to evaluate the layer thickness and Al mole fraction in the AlGaN layer.The presence of a smooth interface is responsible for the observation of intensity oscillation in GIXR,which is well correlated to step flow observation in AFM images of the surface.The structure with a low Al mole fraction(x = 0.25) and thin well width has a rather smooth surface for the R,of AFM data value is 0.45 nm. 展开更多
关键词 metalorganic chemical vapor deposition INTERFACES SURFACES nitrides SUPERLATTICES high resolution x-ray diffraction
原文传递
采用高分辨XRD确定AlxGa1-xN/GaN异质结的应变状态
5
作者 谢自力 张荣 +11 位作者 张彤 周元俊 刘斌 张曾 李弋 宋黎红 崔颖超 傅德颐 修向前 韩平 施毅 郑有炓 《中国科学(G辑)》 CSCD 北大核心 2009年第11期1623-1627,共5页
利用高分辨X射线衍射方法,分析了采用金属有机物汽相沉积生长的AlxGa1-xN/GaN薄膜的晶体结构和应变状态.通过(002)和(105)面的倒易空间映射,分析获得AlxGa1-xN外延层的应变程度,并且计算了不同Al组分的AlxGa1-xN在倒易空间图上的弛豫方... 利用高分辨X射线衍射方法,分析了采用金属有机物汽相沉积生长的AlxGa1-xN/GaN薄膜的晶体结构和应变状态.通过(002)和(105)面的倒易空间映射,分析获得AlxGa1-xN外延层的应变程度,并且计算了不同Al组分的AlxGa1-xN在倒易空间图上的弛豫方向;同时利用Vegard原理,推导了在双轴应变下Al组分的计算方程式,得出完全应变情况下Al组分为30%,与卢瑟福背散射实验结果比较符合. 展开更多
关键词 高分辨X射线衍射 倒易空间图 应变 弛豫
原文传递
Influence of initial growth conditions and Mg-surfactant on the quality of GaN film grown by MOVPE 被引量:2
6
作者 曹峻松 吕欣 +2 位作者 赵璐冰 曲爽 高伟 《Journal of Semiconductors》 EI CAS CSCD 2015年第2期34-37,共4页
The initial growth conditions of a 100 nm thick GaN layer and Mg-surfactant on the quality of the GaN epilayer grown on a 6H-SiC substrate by metal-organic vapor phase epitaxy have been investigated in this research. ... The initial growth conditions of a 100 nm thick GaN layer and Mg-surfactant on the quality of the GaN epilayer grown on a 6H-SiC substrate by metal-organic vapor phase epitaxy have been investigated in this research. Experimental results have shown that a high V/III ratio and the initially low growth rate of the GaN layer are favorable for two-dimension growth and surface morphology of GaN and the formation of a smoother growth surface. Mg-surfactant occurring during GaN growth can reduce the dislocations density of the GaN epilayer but increase the surface RMS, which are attributed to the change of growth mode. 展开更多
关键词 metalorganic vapor phase epitaxy gallium nitride high resolution x-ray diffraction
原文传递
上一页 1 下一页 到第
使用帮助 返回顶部