To improve the efficiency and accuracy of kinematic calibration,the selection of measurement configurations is an important issue.In previous research,optimal measurement configurations mainly are selected by maximizi...To improve the efficiency and accuracy of kinematic calibration,the selection of measurement configurations is an important issue.In previous research,optimal measurement configurations mainly are selected by maximizing observability indices.However,the traditional observability indices only focus on the identification efficiency of the error parameters,while the purpose of robot kinematic calibration is to improve accuracy.To solve the inconsistency of the purpose between the observability index and calibration,the concept of the residual index to represent the residual distribution of the end effector after robot kinematic calibration with the measurement noise is proposed.Based on the quadratic form minimization of residuals,this article defines a specific residual index,O^(r),which is dimensionless and strictly better with the increase of measurement configurations.The indices are used to select measurement configurations in the kinematic calibration of a 5-DOF 2UPU/SP-RR hybrid robot,and the calibration results show that the proposed residual index is better than the traditional indices in the accuracy and stability of the end effector residual.展开更多
a-C:F films are deposited by microwave electron cyclotron resonance (ECR)plasma chemical vapor deposition (CVD) using trifluoromethane (CHF3) and benzene (C6H6) as source gases at different microwave powers. The radic...a-C:F films are deposited by microwave electron cyclotron resonance (ECR)plasma chemical vapor deposition (CVD) using trifluoromethane (CHF3) and benzene (C6H6) as source gases at different microwave powers. The radicals in plasma originating from source gases dissociation are analyzed by relative irradiance measurement. The bonding configurations and binding state of a-C:F films are measured with Fourier-transformed infrared spectrometer (FTIR) and x-ray photoelectron spectroscopy (XPS). The results show that a-C:F films are mainly composed of CF radical at lower powers but of CF2 radical at higher powers. The deposition of films is related to the radicals generated in plasma and the main bonding configurations are dependent on the ratio of CF to CF2 radicals in films.展开更多
基金supported by the National Natural Science Foundation of China (Grant No.51975321)EU H2020-MSCA-RISE-ECSASDPE (Grant No.734272)Tsinghua-Jiangyin Innovation Special Fund (Grant No.TJISF 2022JYTH01)。
文摘To improve the efficiency and accuracy of kinematic calibration,the selection of measurement configurations is an important issue.In previous research,optimal measurement configurations mainly are selected by maximizing observability indices.However,the traditional observability indices only focus on the identification efficiency of the error parameters,while the purpose of robot kinematic calibration is to improve accuracy.To solve the inconsistency of the purpose between the observability index and calibration,the concept of the residual index to represent the residual distribution of the end effector after robot kinematic calibration with the measurement noise is proposed.Based on the quadratic form minimization of residuals,this article defines a specific residual index,O^(r),which is dimensionless and strictly better with the increase of measurement configurations.The indices are used to select measurement configurations in the kinematic calibration of a 5-DOF 2UPU/SP-RR hybrid robot,and the calibration results show that the proposed residual index is better than the traditional indices in the accuracy and stability of the end effector residual.
文摘a-C:F films are deposited by microwave electron cyclotron resonance (ECR)plasma chemical vapor deposition (CVD) using trifluoromethane (CHF3) and benzene (C6H6) as source gases at different microwave powers. The radicals in plasma originating from source gases dissociation are analyzed by relative irradiance measurement. The bonding configurations and binding state of a-C:F films are measured with Fourier-transformed infrared spectrometer (FTIR) and x-ray photoelectron spectroscopy (XPS). The results show that a-C:F films are mainly composed of CF radical at lower powers but of CF2 radical at higher powers. The deposition of films is related to the radicals generated in plasma and the main bonding configurations are dependent on the ratio of CF to CF2 radicals in films.
