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Modulated optical and ferroelectric properties in a lateral structured ferroelectric/semiconductor van der Waals heterojunction
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作者 陈珊珊 张新昊 +5 位作者 王广灿 陈朔 马和奇 孙天瑜 满宝元 杨诚 《Chinese Physics B》 SCIE EI CAS CSCD 2023年第12期509-516,共8页
Modulation between optical and ferroelectric properties was realized in a lateral structured ferroelectric CuInP_(2)S_(6)(CIPS)/semiconductor MoS_(2) van der Waals heterojunction.The ferroelectric hysteresis loop area... Modulation between optical and ferroelectric properties was realized in a lateral structured ferroelectric CuInP_(2)S_(6)(CIPS)/semiconductor MoS_(2) van der Waals heterojunction.The ferroelectric hysteresis loop area was modulated by the optical field.Two types of photodetection properties can be realized in a device by changing the ON and OFF states of the ferroelectric layer.The device was used as a photodetector in the OFF state but not in the ON state.The higher tunnelling electroresistance(~1.4×10^(4))in a lateral structured ferroelectric tunnelling junction was crucial,and it was analyzed and modulated by the barrier height and width of the ferroelectric CIPS/semiconductor MoS_(2) Schottky junction.The new parameter of the ferroelectric hysteresis loop area as a function of light intensity was introduced to analyze the relationship between the ferroelectric and photodetection properties.The proposed device has potential application as an optoelectronic sensory cell in the biological nervous system or as a new type of photodetector. 展开更多
关键词 ferroelectric tunnelling junction metal/ferroelectric/semiconductor tunnelling electroresistance optoelectronic properties
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Engineering Ferroelectric Interlayer between Li_(1.3)Al_(0.3)Ti_(1.7)(PO_(4))_(3)and Lithium Metal for Stable Solid-State Batteries Operating at Room Temperature 被引量:1
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作者 Tian Gu Likun Chen +6 位作者 Yanfei Huang Jiabin Ma Peiran Shi Jie Biao Ming Liu Wei Lu Yanbing He 《Energy & Environmental Materials》 SCIE EI CAS CSCD 2023年第6期305-311,共7页
The poor contact and side reactions between Li_(1.3)Al_(0.3)Ti_(1.7)(PO_(4))_(3)(LATP)and lithium(Li)anode cause uneven Li plating and high interfacial impendence,which greatly hinder the practical application of LATP... The poor contact and side reactions between Li_(1.3)Al_(0.3)Ti_(1.7)(PO_(4))_(3)(LATP)and lithium(Li)anode cause uneven Li plating and high interfacial impendence,which greatly hinder the practical application of LATP in high-energy density solid-state Li metal batteries.In this work,a multifunctional ferroelectric BaTiO_(3)(BTO)/poly(vinylidene fluoride-co-trifluoroethylene-co-chlorotrifluoroethylene)(P[VDF-TrFE-CTFE])composite interlayer(B-TERB)is constructed between LATP and Li metal anode,which not only suppresses the Li dendrite growth,but also improves the interfacial stability and maintains the intimate interfacial contact to significantly decrease the interfacial resistance by two orders of magnitude.The B-TERB interlayer generates a uniform electric field to induce a uniform and lateral Li deposition,and therefore avoids the side reactions between Li metal and LATP achieving excellent interface stability.As a result,the Li/LATP@B-TERB/Li symmetrical batteries can stably cycle for 1800 h at 0.2 mA cm^(-2)and 1000 h at 0.5 mA cm^(-2).The solid-state LiFePO_(4)/LATP@B-TERB/Li full batteries also exhibit excellent cycle performance for 250 cycles at 0.5 C and room temperature.This work proposes a novel strategy to design multifunctional ferroelectric interlayer between ceramic electrolytes and Li metal to enable stable room-temperature cycling performance. 展开更多
关键词 BaTiO_(3) DENDRITES ferroelectric Li_(1.3)Al_(0.3)Ti_(1.7)(PO_(4))_(3) lithium metal
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Valley polarization in transition metal dichalcogenide layered semiconductors:Generation,relaxation,manipulation and transport
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作者 马惠 朱耀杰 +4 位作者 刘宇伦 白瑞雪 张喜林 任琰博 蒋崇云 《Chinese Physics B》 SCIE EI CAS CSCD 2023年第10期1-14,共14页
In recent years,valleytronics researches based on 2D semiconducting transition metal dichalcogenides have attracted considerable attention.On the one hand,strong spin–orbit interaction allows the presence of spin–va... In recent years,valleytronics researches based on 2D semiconducting transition metal dichalcogenides have attracted considerable attention.On the one hand,strong spin–orbit interaction allows the presence of spin–valley coupling in this system,which provides spin addressable valley degrees of freedom for information storage and processing.On the other hand,large exciton binding energy up to hundreds of me V enables excitons to be stable carriers of valley information.Valley polarization,marked by an imbalanced exciton population in two inequivalent valleys(+K and-K),is the core of valleytronics as it can be utilized to store binary information.Motivated by the potential applications,we present a thorough overview of the recent advancements in the generation,relaxation,manipulation,and transport of the valley polarization in nonmagnetic transition metal dichalcogenide layered semiconductors.We also discuss the development of valleytronic devices and future challenges in this field. 展开更多
关键词 valley polarization nonmagnetic transition metal dichalcogenide layered semiconductors EXCITON
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Self-Adaptive and Electric Field-Driven Protective Layer with Anchored Lithium Deposition Enable Stable Lithium Metal Anode
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作者 Ting Chen Luchao Yue +8 位作者 Guoqiang Shu Qing Yang Dong Wang Ruoyang Wang Xianyan Qiao Yan Sun Benhe Zhong Zhenguo Wu Xiaodong Guo 《Energy & Environmental Materials》 SCIE EI CAS CSCD 2024年第3期32-40,共9页
Lithium metal battery has great development potential because of its lowest electrochemical potential and highest theoretical capacity.However,the uneven deposition of Li^(+)flux in the process of deposition and strip... Lithium metal battery has great development potential because of its lowest electrochemical potential and highest theoretical capacity.However,the uneven deposition of Li^(+)flux in the process of deposition and stripping induces the vigorous growth of lithium dendrites,which results in severely battery performance degradation and serious safety hazards.Here,the tetragonal BaTiO3 polarized by high voltage corona was used to build an artificial protective layer with uniform positive polarization direction,which enables uniform Li^(+)flux.In contrast to traditional strategies of using protective layer,which can guide the uniform deposition of lithium metal.The ferroelectric protective layer can accurately anchor the Li^(+)and achieve bottom deposition of lithium due to the automatic adjustment of the electric field.Simultaneously,the huge volume changes caused by Li^(+)migration change of the lithium metal anode during charging and discharging is functioned to excite the piezoelectric effect of the protective layer,and achieve seamless dynamic tuning of lithium deposition/stripping.This dynamic effect can accurately anchor and capture Li^(+).Finally,the layer-modified Li anode enables reversible Li plating/stripping over 1500 h at 1 mA cm^(-2)and 50℃in symmetric cells.In addition,the assembled Li-S full cell exhibits over 300 cycles with N/P≈1.35.This work provides a new perspective on the uniform Li^(+)flux at the Li-anode interface of the artificial protective layer. 展开更多
关键词 dense plating/stripping process electric field ferroelectric materials lithium metal batteries solid electrolyte interphase
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Strain-induced insulator–metal transition in ferroelectric BaTiO_3(001) surface:First-principles study
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作者 杨林 王长安 +5 位作者 刘聪 秦明辉 陆旭兵 高兴森 曾敏 刘俊明 《Chinese Physics B》 SCIE EI CAS CSCD 2016年第7期378-381,共4页
The electronic properties of TiO2-terminated BaTiO3(001) surface subjected to biaxial strain have been studied using first-principles calculations based on density functional theory. The Ti ions are always inward s... The electronic properties of TiO2-terminated BaTiO3(001) surface subjected to biaxial strain have been studied using first-principles calculations based on density functional theory. The Ti ions are always inward shifted either at compressive or tension strains, while the inward shift of the Ba ions occurs only for high compressive strain, implying an enhanced electric dipole moment in the case of high compressive strain. In particular, an insulator–metal transition is predicted at a compressive biaxial strain of 0.0475. These changes present a very interesting possibility for engineering the electronic properties of ferroelectric BaTiO3(001) surface. 展开更多
关键词 first-principles ferroelectricity insulator–metal transition strain-induced effect
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Direct Tunneling Effect in Metal-Semiconductor Contacts Simulated with Monte Carlo Method 被引量:2
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作者 孙雷 杜刚 +1 位作者 刘晓彦 韩汝琦 《Journal of Semiconductors》 EI CAS CSCD 北大核心 2001年第11期1364-1368,共5页
Considering the tunneling effect and the Schottky effect,the metal semiconductor contact is simulated by using self consistent ensemble Monte Carlo method.Under different biases or at different barrier heights,the i... Considering the tunneling effect and the Schottky effect,the metal semiconductor contact is simulated by using self consistent ensemble Monte Carlo method.Under different biases or at different barrier heights,the investigation into the tunneling current indicates that the tunneling effect is of great importance under reverse biases.The Schottky barrier diode current due to Schottky effect is in agreement with the theoretical one.The barrier lowering is found a profound effect on the current transport at the metal semiconductor interface. 展开更多
关键词 Monte Carlo device simulation metal semiconductor contact direct tunneling Schottky effect
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Recent Progress on Flexible Room-Temperature Gas Sensors Based on Metal Oxide Semiconductor 被引量:7
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作者 Lang-Xi Ou Meng-Yang Liu +2 位作者 Li-Yuan Zhu David Wei Zhang Hong-Liang Lu 《Nano-Micro Letters》 SCIE EI CAS CSCD 2022年第12期310-351,共42页
With the rapid development of the Internet of Things,there is a great demand for portable gas sensors.Metal oxide semiconductors(MOS)are one of the most traditional and well-studied gas sensing materials and have been... With the rapid development of the Internet of Things,there is a great demand for portable gas sensors.Metal oxide semiconductors(MOS)are one of the most traditional and well-studied gas sensing materials and have been widely used to prepare various commercial gas sensors.However,it is limited by high operating temperature.The current research works are directed towards fabricating high-performance flexible room-temperature(FRT)gas sensors,which are effective in simplifying the structure of MOS-based sensors,reducing power consumption,and expanding the application of portable devices.This article presents the recent research progress of MOS-based FRT gas sensors in terms of sensing mechanism,performance,flexibility characteristics,and applications.This review comprehensively summarizes and discusses five types of MOS-based FRT gas sensors,including pristine MOS,noble metal nanoparticles modified MOS,organic polymers modified MOS,carbon-based materials(carbon nanotubes and graphene derivatives)modified MOS,and two-dimensional transition metal dichalcogenides materials modified MOS.The effect of light-illuminated to improve gas sensing performance is further discussed.Furthermore,the applications and future perspectives of FRT gas sensors are also discussed. 展开更多
关键词 metal oxide semiconductor Flexible gas sensor Room temperature NANOMATERIALS
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Directing the photogenerated charge flow in a photocathodic metal protection system with single-domain ferroelectric PbTiO_(3)nanoplates
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作者 Hui Xie Jianyou Yu +3 位作者 Yuchen Fang Zhijun Wang Shihe Yang Zheng Xing 《Electron》 2024年第3期1-12,共12页
Photocathodic protection(PCP)is arguably an ideal alternative technology to the conventional electrochemical cathodic protection methods for corrosion mitigation of metallic infrastructure due to its eco-friendliness ... Photocathodic protection(PCP)is arguably an ideal alternative technology to the conventional electrochemical cathodic protection methods for corrosion mitigation of metallic infrastructure due to its eco-friendliness and low-energy-consumption,but the construction of highlyefficient PCP systems still remains challenging,caused primarily by the lack of driving force to guide the charge flow through the whole PCP photoanodes.Here,we tackle this key issue by equipping the PCP photoanode with ferroelectric single-domain PbTiO_(3)nanoplates,which can form a directional“macroscopic electric field”throughout the entire photoanode controllable by external polarization.The properly poled PCP photoanode allows the photogenerated electrons and holes to migrate in opposite directions,that is,electrons to the protected metal and holes to the photoanode/electrolyte interface,leading to largely suppressed charge annihilation and consequently a considerable boost in the overall solar energy conversion efficiency of the PCP system.The as-fabricated photoanode can not only supply sufficient photocurrent to 304 stainless steel to initiate cathodic protection,but also shift the metal potential to the corrosion-free range.Our findings provide a viable design strategy for future high-performance PCP systems based on ferroelectric nanomaterials with enhanced charge flow manipulation. 展开更多
关键词 charge separation energy conversion ferroelectric materials photocathodic metal protection semiconductorS
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Photoelectrocatalytic hydrogen peroxide production based on transition‐metal‐oxide semiconductors 被引量:2
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作者 Haijiao Lu Xianlong Li +2 位作者 Sabiha Akter Monny Zhiliang Wang Lianzhou Wang 《Chinese Journal of Catalysis》 SCIE EI CAS CSCD 2022年第5期1204-1215,共12页
As a kind of valuable chemicals,hydrogen peroxide(H2O2)has aroused growing attention in many fields.However,H2O2 production via traditional anthraquinone process suffers from challenges of large energy consumption and... As a kind of valuable chemicals,hydrogen peroxide(H2O2)has aroused growing attention in many fields.However,H2O2 production via traditional anthraquinone process suffers from challenges of large energy consumption and heavy carbon footprint.Alternatively,photoelectrocatalytic(PEC)production of H2O2 has shown great promises to make H2O2 a renewable fuel to store solar energy.Transition‐metal‐oxide(TMO)semiconductor based photoelectrocatalysts are among the most promising candidates for PEC H2O2 production.In this work,the fundamentals of H2O2 synthesis through PEC process are briefly introduced,followed by the state‐of‐the‐art of TMO semiconductor based photoelectrocatalysts for PEC production H2O2.Then,the progress on H2O2 fuel cells from on‐site PEC production is presented.Furthermore,the challenges and future perspectives of PEC H2O2 production are discussed.This review aims to provide inspiration for the PEC production of H2O2 as a renewable solar fuel. 展开更多
关键词 Hydrogen peroxide Solar fuel PHOTOELECTROCATALYSIS Transition‐metal‐oxide semiconductor Fuel cell
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Structural evolution of low-dimensional metal oxide semiconductors under external stress 被引量:1
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作者 Peili Zhao Lei Li +9 位作者 Guoxujia Chen Xiaoxi Guan Ying Zhang Weiwei Meng Ligong Zhao Kaixuan Li Renhui Jiang Shuangfeng Jia He Zheng Jianbo Wang 《Journal of Semiconductors》 EI CAS CSCD 2022年第4期60-66,共7页
Metal oxide semiconductors(MOSs) are attractive candidates as functional parts and connections in nanodevices.Upon spatial dimensionality reduction, the ubiquitous strain encountered in physical reality may result in ... Metal oxide semiconductors(MOSs) are attractive candidates as functional parts and connections in nanodevices.Upon spatial dimensionality reduction, the ubiquitous strain encountered in physical reality may result in structural instability and thus degrade the performance of MOS. Hence, the basic insight into the structural evolutions of low-dimensional MOS is a prerequisite for extensive applications, which unfortunately remains largely unexplored. Herein, we review the recent progress regarding the mechanical deformation mechanisms in MOSs, such as CuO and ZnO nanowires(NWs). We report the phase transformation of CuO NWs resulting from oxygen vacancy migration under compressive stress and the tensile strain-induced phase transition in ZnO NWs. Moreover, the influence of electron beam irradiation on interpreting the mechanical behaviors is discussed. 展开更多
关键词 metal oxide semiconductor phase transition STRAIN NANOWIRE in-situ transmission electron microscopy
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Effect of NO annealing on charge traps in oxide insulator and transition layer for 4H-SiC metal–oxide–semiconductor devices 被引量:1
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作者 贾一凡 吕红亮 +10 位作者 钮应喜 李玲 宋庆文 汤晓燕 李诚瞻 赵艳黎 肖莉 王梁永 唐光明 张义门 张玉明 《Chinese Physics B》 SCIE EI CAS CSCD 2016年第9期484-488,共5页
The effect of nitric oxide(NO) annealing on charge traps in the oxide insulator and transition layer in n-type4H–Si C metal–oxide–semiconductor(MOS) devices has been investigated using the time-dependent bias s... The effect of nitric oxide(NO) annealing on charge traps in the oxide insulator and transition layer in n-type4H–Si C metal–oxide–semiconductor(MOS) devices has been investigated using the time-dependent bias stress(TDBS),capacitance–voltage(C–V),and secondary ion mass spectroscopy(SIMS).It is revealed that two main categories of charge traps,near interface oxide traps(Nniot) and oxide traps(Not),have different responses to the TDBS and C–V characteristics in NO-annealed and Ar-annealed samples.The Nniotare mainly responsible for the hysteresis occurring in the bidirectional C–V characteristics,which are very close to the semiconductor interface and can readily exchange charges with the inner semiconductor.However,Not is mainly responsible for the TDBS induced C–V shifts.Electrons tunneling into the Not are hardly released quickly when suffering TDBS,resulting in the problem of the threshold voltage stability.Compared with the Ar-annealed sample,Nniotcan be significantly suppressed by the NO annealing,but there is little improvement of Not.SIMS results demonstrate that the Nniotare distributed within the transition layer,which correlated with the existence of the excess silicon.During the NO annealing process,the excess Si atoms incorporate into nitrogen in the transition layer,allowing better relaxation of the interface strain and effectively reducing the width of the transition layer and the density of Nniot. 展开更多
关键词 4H–SiC metal–oxide–semiconductor devices NO annealing near interface oxide traps oxide traps
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Mobility enhancement of strained GaSb p-channel metal-oxide-semiconductor field-effect transistors with biaxial compressive strain 被引量:2
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作者 陈燕文 谭桢 +6 位作者 赵连锋 王敬 刘易周 司晨 袁方 段文晖 许军 《Chinese Physics B》 SCIE EI CAS CSCD 2016年第3期448-452,共5页
Various biaxial compressive strained GaSb p-channel metal-oxide-semiconductor field-effect transistors (MOSFETs) are experimentally and theoretically investigated, The biaxial compressive strained GaSb MOSFETs show ... Various biaxial compressive strained GaSb p-channel metal-oxide-semiconductor field-effect transistors (MOSFETs) are experimentally and theoretically investigated, The biaxial compressive strained GaSb MOSFETs show a high peak mobility of 638 cm2/V.s, which is 3.86 times of the extracted mobility of the fabricated GaSb MOSFETs without strain. Meanwhile, first principles calculations show that the hole effective mass of GaSb depends on the biaxial compressive strain. The biaxiai compressive strain brings a remarkable enhancement of the hole mobility caused by a significant reduction in the hole effective mass due to the modulation of the valence bands. 展开更多
关键词 GASB metal-oxide-semiconductor field-effect transistor STRAIN first principles calculations
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Effect of crystallization temperature on microstructure and ferroelectric property of Bi_(3.25)Eu_(0.75)Ti_3O_(12) thin films prepared by MOD method 被引量:1
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作者 何林 张彤 +1 位作者 唐明华 邓水凤 《中国有色金属学会会刊:英文版》 CSCD 2006年第5期1154-1158,共5页
Europium-substituted bismuth titanate (Bi3.25Eu0.75Ti3O12) thin films were deposited on the Pt/Ti/SiO2/Si(111) substrates by metal-organic decomposition (MOD) method using a repeated coating/drying cycle. Effect of cr... Europium-substituted bismuth titanate (Bi3.25Eu0.75Ti3O12) thin films were deposited on the Pt/Ti/SiO2/Si(111) substrates by metal-organic decomposition (MOD) method using a repeated coating/drying cycle. Effect of crystallization temperature on microstructure of Bi3.25Eu0.75Ti3O12(BET) thin films was investigated by X-ray diffractometry(XRD), scanning electron microscopy (SEM) and Raman spectroscopy, and ferroelectric property was studied by Precision Workstation Ferroelectric Tester. The crystallinity of BET thin films is improved and the average grain size increases with the crystallization temperature from 600 to 750 ℃. Under 9 V applied voltage, the remnant polarization (2Pr) of BET thin films annealed at 700 ℃ is 50.7 μm/cm2, which is higher than that of the films annealed at 600, 650 and 750℃. 展开更多
关键词 BET薄膜 铁电性能 金属有机分解 钙钛矿 MOD
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Wet thermal annealing effect on TaN/HfO_2/Ge metal-oxide-semiconductor capacitors with and without a GeO_2 passivation layer 被引量:3
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作者 刘冠洲 李成 +7 位作者 路长宝 唐锐钒 汤梦饶 吴政 杨旭 黄巍 赖虹凯 陈松岩 《Chinese Physics B》 SCIE EI CAS CSCD 2012年第11期467-473,共7页
Wet thermal annealing effects on the properties of TaN/HfO2/Ge metal-oxide-semiconductor (MOS) structures with and without a GeO2 passivation layer are investigated. The physical and the electrical properties are ch... Wet thermal annealing effects on the properties of TaN/HfO2/Ge metal-oxide-semiconductor (MOS) structures with and without a GeO2 passivation layer are investigated. The physical and the electrical properties are characterized by X-ray photoemission spectroscopy, high-resolution transmission electron microscopy, capacitance-voltage (C-V) and current-voltage characteristics. It is demonstrated that wet thermal annealing at relatively higher temperature such as 550 ℃ can lead to Ge incorporation in HfO2 and the partial crystallization of HfO2, which should be responsible for the serious degradation of the electrical characteristics of the TaN/HfO2/Ge MOS capacitors. However, wet thermal annealing at 400 ℃ can decrease the GeOx interlayer thickness at the HfO2/Ge interface, resulting in a significant reduction of the interface states and a smaller effective oxide thickness, along with the introduction of a positive charge in the dielectrics due to the hydrolyzable property of GeOx in the wet ambient. The pre-growth of a thin GeO2 passivation layer can effectively suppress the interface states and improve the C V characteristics for the as-prepared HfO2 gated Ge MOS capacitors, but it also dissembles the benefits of wet thermal annealing to a certain extent. 展开更多
关键词 HfO2 dielectric on germanium X-ray photoemission spectroscopy wet thermal anneal-ing metal-oxide semiconductor capacitor
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Multifunctional silicon-based light emitting device in standard complementary metal oxide semiconductor technology 被引量:2
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作者 王伟 黄北举 +1 位作者 董赞 陈弘达 《Chinese Physics B》 SCIE EI CAS CSCD 2011年第1期677-683,共7页
A three-terminal silicon-based light emitting device is proposed and fabricated in standard 0.35 μm complementary metal-oxide-semiconductor technology. This device is capable of versatile working modes: it can emit ... A three-terminal silicon-based light emitting device is proposed and fabricated in standard 0.35 μm complementary metal-oxide-semiconductor technology. This device is capable of versatile working modes: it can emit visible to near infra-red (NIR) light (the spectrum ranges from 500 nm to 1000 nm) in reverse bias avalanche breakdown mode with working voltage between 8.35 V-12 V and emit NIR light (the spectrum ranges from 900 nm to 1300 nm) in the forward injection mode with working voltage below 2 V. An apparent modulation effect on the light intensity from the polysilicon gate is observed in the forward injection mode. Furthermore, when the gate oxide is broken down, NIR light is emitted from the polysilicon/oxide/silicon structure. Optoelectronic characteristics of the device working in different modes are measured and compared. The mechanisms behind these different emissions are explored. 展开更多
关键词 optoelectronic integrated circuit complementary metal-oxide-semiconductor technology silicon-based light emitting device ELECTROLUMINESCENCE
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Effect of depositing PCBM on perovskite-based metal–oxide–semiconductor field effect transistors 被引量:1
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作者 Su-Zhen Luan Yu-Cheng Wang +1 位作者 Yin-Tao Liu Ren-Xu Jia 《Chinese Physics B》 SCIE EI CAS CSCD 2018年第4期391-395,共5页
In this manuscript,the perovskite-based metal–oxide–semiconductor field effect transistors(MOSFETs) with phenylC61-butyric acid methylester(PCBM) layers are studied.The MOSFETs are fabricated on perovskites,and ... In this manuscript,the perovskite-based metal–oxide–semiconductor field effect transistors(MOSFETs) with phenylC61-butyric acid methylester(PCBM) layers are studied.The MOSFETs are fabricated on perovskites,and characterized by photoluminescence spectra(PL),x-ray diffraction(XRD),and x-ray photoelectron spectroscopy(XPS).With PCBM layers,the current–voltage hysteresis phenomenon is effetely inhibited,and both the transfer and output current values increase.The band energy diagrams are proposed,which indicate that the electrons are transferred into the PCBM layer,resulting in the increase of photocurrent.The electron mobility and hole mobility are extracted from the transfer curves,which are about one order of magnitude as large as those of PCBM deposited,which is the reason why the electrons are transferred into the PCBM layer and the holes are still in the perovskites,and the effects of ionized impurity scattering on carrier transport become smaller. 展开更多
关键词 metal-oxide-semiconductor field effect transistors photoelectric characteristics PEROVSKITE
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High-voltage super-junction lateral double-diffused metal-oxide semiconductor with a partial lightly doped pillar 被引量:3
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作者 伍伟 张波 +2 位作者 方健 罗小蓉 李肇基 《Chinese Physics B》 SCIE EI CAS CSCD 2013年第6期633-636,共4页
A novel super-junction lateral double-diffused metal-oxide semiconductor (SJ-LDMOS) with a partial lightly doped P pillar (PD) is proposed. Firstly, the reduction in the partial P pillar charges ensures the charge... A novel super-junction lateral double-diffused metal-oxide semiconductor (SJ-LDMOS) with a partial lightly doped P pillar (PD) is proposed. Firstly, the reduction in the partial P pillar charges ensures the charge balance and suppresses the substrate-assisted depletion effect. Secondly, the new electric field peak produced by the P/P junction modulates the surface electric field distribution. Both of these result in a high breakdown voltage (BV). In addition, due to the same conduction paths, the specific on-resistance (Ron,sp) of the PD SJ-LDMOS is approximately identical to the conventional SJ-LDMOS. Simulation results indicate that the average value of the surface lateral electric field of the PD SJ-LDMOS reaches 20 V/μm at a 15 μm drift length, resulting in a BV of 300 V. 展开更多
关键词 super-junction lateral double-diffused metal-oxide semiconductor partial lightly doped pillar electric field modulation breakdown voltage
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Recent Progress in Ferroelectric Diodes: Explorations in Switchable Diode Effect
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作者 Chen Ge Can Wang +2 位作者 Kui-juan Jin Hui-bin Lu Guo-zhen Yang 《Nano-Micro Letters》 SCIE EI CAS 2013年第2期81-87,共7页
Switchable diode effect in ferroelectric diodes has attracted much attention for its potential applications in novel nonvolatile memories. We briefly review recent investigations on the switchable diode effect in ferr... Switchable diode effect in ferroelectric diodes has attracted much attention for its potential applications in novel nonvolatile memories. We briefly review recent investigations on the switchable diode effect in ferroelectric diodes both experimentally and theoretically. Many recent studies demonstrate that the interfacial barrier between the metal-ferroelectrics could be modulated by the polarization charges, and the ferroelectric polarization that can be reversed by an external electric field plays a dominant role in the switchable diode effect. Moreover, we review a self-consistent numerical model, which can well describe the switchable diode effect in ferroelectric diodes. Based on this model, it can be predicted that it is a better choice to select metals with a smaller permittivity, such as noble metals, to obtain a more pronounced switchable diode effect in ferroelectric diodes. 展开更多
关键词 ferroelectric diodes Switchable diode effect metal/ferroelectrics/metal structure Self-consistent mode
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Improved interfacial and electrical properties of GaSb metal oxide semiconductor devices passivated with acidic(NH_4)_2S solution
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作者 赵连锋 谭桢 +1 位作者 王敬 许军 《Chinese Physics B》 SCIE EI CAS CSCD 2014年第7期744-747,共4页
Surface passivation with acidic (NH4)2S solution is shown to be effective in improving the interfacial and electrical properties of HfOE/GaSb metal oxide semiconductor devices. Compared with control samples, the sam... Surface passivation with acidic (NH4)2S solution is shown to be effective in improving the interfacial and electrical properties of HfOE/GaSb metal oxide semiconductor devices. Compared with control samples, the samples treated with acidic (NH4)2S solution show great improvements in gate leakage current, frequency dispersion, border trap density, and interface trap density. These improvements are attributed to the enhancing passivation of the substrates, according to analysis from the perspective of chemical mechanism, X-ray photoelectron spectroscopy, and high-resolution cross-sectional transmission electron microscopy. 展开更多
关键词 GASB metal oxide semiconductor sulfur passivation
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Stacked lateral double-diffused metal–oxide–semiconductor field effect transistor with enhanced depletion effect by surface substrate
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作者 Qi Li Zhao-Yang Zhang +3 位作者 Hai-Ou Li Tang-You Sun Yong-He Chen Yuan Zuo 《Chinese Physics B》 SCIE EI CAS CSCD 2019年第3期328-332,共5页
A stacked lateral double-diffused metal–oxide–semiconductor field-effect transistor(LDMOS) with enhanced depletion effect by surface substrate is proposed(ST-LDMOS), which is compatible with the traditional CMOS pro... A stacked lateral double-diffused metal–oxide–semiconductor field-effect transistor(LDMOS) with enhanced depletion effect by surface substrate is proposed(ST-LDMOS), which is compatible with the traditional CMOS processes. The new stacked structure is characterized by double substrates and surface dielectric trenches(SDT). The drift region is separated by the P-buried layer to form two vertically parallel devices. The doping concentration of the drift region is increased benefiting from the enhanced auxiliary depletion effect of the double substrates, leading to a lower specific on-resistance(Ron,sp). Multiple electric field peaks appear at the corners of the SDT, which improves the lateral electric field distribution and the breakdown voltage(BV). Compared to a conventional LDMOS(C-LDMOS), the BV in the ST-LDMOS increases from 259 V to 459 V, an improvement of 77.22%. The Ron,sp decreases from 39.62 m?·cm^2 to 23.24 m?·cm^2 and the Baliga's figure of merit(FOM) of is 9.07 MW/cm^2. 展开更多
关键词 double substrates SURFACE dielectric trench stacked LATERAL double-diffused metal–oxide– semiconductor FIELD-EFFECT transistor(ST-LDMOS) breakdown voltage
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