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Simulation of Reactive Distillation Process for Monosilane Production via Redistribution of Trichlorosilane
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作者 孙帅帅 黄国强 《Chinese Journal of Chemical Engineering》 SCIE EI CAS CSCD 2014年第3期287-293,共7页
The reactive distillation process for producing high purity monosilane via trichlorosilane redistribution reaction was simulated. Rigorous RadFrac block was employed in Aspen Plus simulation package. Accurate results ... The reactive distillation process for producing high purity monosilane via trichlorosilane redistribution reaction was simulated. Rigorous RadFrac block was employed in Aspen Plus simulation package. Accurate results could be given when the chemical kinetics was taken into account in the equilibrium stage model. A single column process was used for the verification of previous studies. The results showed that 99.9% purity monosilane could be achieved in the reactive distillation. A pumparound block was employed to reduce the condenser duty with inexpen-sive coolant. The effects of operating pressure, feed stage location, liquid holdup per stage and pumparound location were also investigated. The energy consumption was limited, but the refrigerant temperature was too low, which is the fatal disadvantage. Therefore, a double columns process was developed to increase the condenser tem-perature. The simulation results demonstrated that a reasonable temperature could be achieved by varying the recycle stream location. 展开更多
关键词 reactive distillation reaction kinetics trichlorosilane redistribution pumparound monosilane
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Multiphoton Ionization of Monosilane
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作者 陆庆正 丁传凡 +2 位作者 刁培谦 孔繁敖 松为宏幸 《Science China Chemistry》 SCIE EI CAS 1993年第2期178-186,共9页
The (3 + 1) photon ionization spectra of SiH_4 have been measured. A basically continuous spectrum was recorded in laser wavelengths from 428 to 458 nm.Two vibrational progressions were found in the UV laser region of... The (3 + 1) photon ionization spectra of SiH_4 have been measured. A basically continuous spectrum was recorded in laser wavelengths from 428 to 458 nm.Two vibrational progressions were found in the UV laser region of 347-392 nm, anda fine structure of the band at 363.5 nm was assigned.The fragment ions were detected by a time-offlight mass spectrometer. No parent ion SiH_4^+ was observed whereas SiH_2^+ and SiH_3^+ were the major products. The ratio of SiH_2^+/SiH_3^+ was approximately equal to that of single photon ionization at the same energy, but the fraction of Si^+ was increased. Some additional bands appeared in Si^+ spectrum in the range of 384-390 nm implicating that the increased Si^+ might be generated from SiH_2^+ and SiH^+ ions. 展开更多
关键词 MULTIPHOTON PROCESSES LASER PHOTOIONIZATION MASS DETECTION monosilane.
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