In order to get atomic smooth rigid disk substrate surface, ultra-fined alumina slurry and nanometer silica slurry are prepared, and two steps chemical-mechanical polishing （CMP） of rigid disk substrate in the two s...In order to get atomic smooth rigid disk substrate surface, ultra-fined alumina slurry and nanometer silica slurry are prepared, and two steps chemical-mechanical polishing （CMP） of rigid disk substrate in the two slurries are studied. The results show that, during the first step CMP in the alumina slurry, a high material removal rate is reached, and the average roughness （Ra） and the average waviness （Wa） of the polished surfaces can be decreased from previous 1.4 nm and 1.6 nm to about 0.6 nm and 0.7 nm, respectively. By using the nanometer silica slurry and optimized polishing process parameters in the second step CMP, the Ra and the Wa of the polished surfaces can be further reduced to 0.038 nm and 0.06 am, respectively. Atom force microscopy （AFM） analysis shows that the final polished surfaces are ultra-smooth without micro-defects.展开更多
For the purpose of solving the problem that too large pole tip recession （PTR） is produced in magnetic rigid disk heads by mechanical polishing, a chemical mechanical nano-grinding experiment is performed by using a...For the purpose of solving the problem that too large pole tip recession （PTR） is produced in magnetic rigid disk heads by mechanical polishing, a chemical mechanical nano-grinding experiment is performed by using a float-piece polisher with a tin plate to achieve a more plane and smoother surface. A basal solution, addition agents and a range of pH value are suitably selected to find a kind of slurry, with which the PTR can be controlled on sub-nanometer scale and the giant magnetic resistance （GMR） corrosion and electrostatic damage （ESD） can be avoided. Moreover, the cause that TiC protrudes from the substrate surface of the heads is studied. The appropriate shape and size of diamond abrasive are selected according to the chemical activation of A1203 and TiC in the same slurry. In this way, the chemical and mechanical interactions are optimized and the optimal surface that has small PTR and TiC asperity is achieved. Ultimatily, the chemical mechanical nano-grinding in combination with mechanical nano-grinding is adopted. Sub-nanometer PTR is achieved and the TiC asperity is eliminated by the chemical mechanical nano-grinding with large size ofmonocrystalline followed by mechanical nano-grinding with smalle polycrystalline diamonds.展开更多
On the basis of analysing the character of granite and its polishing technology, the authors have manufactured a kind of polishing disk to polish granite and good results have been obtained. Through studying the polis...On the basis of analysing the character of granite and its polishing technology, the authors have manufactured a kind of polishing disk to polish granite and good results have been obtained. Through studying the polishing process of granite in theory and experiment, the authors think that the high glossiness surface is the result of grinding of abrasives and adhering of soft metal. Moreover, orthogonal test is carried out about the technical parameters for threee typical kinds of granites and some useful results for production are obtained.展开更多
基金This project is supported by National Basic Research Program of China (973 Program, N0.2003CB716201)National Natural Science Foundation of China (No.50575131)Science Foundation of Shanghai Municipal Commission of Science and Technology, China(No.0452nm013).
文摘In order to get atomic smooth rigid disk substrate surface, ultra-fined alumina slurry and nanometer silica slurry are prepared, and two steps chemical-mechanical polishing （CMP） of rigid disk substrate in the two slurries are studied. The results show that, during the first step CMP in the alumina slurry, a high material removal rate is reached, and the average roughness （Ra） and the average waviness （Wa） of the polished surfaces can be decreased from previous 1.4 nm and 1.6 nm to about 0.6 nm and 0.7 nm, respectively. By using the nanometer silica slurry and optimized polishing process parameters in the second step CMP, the Ra and the Wa of the polished surfaces can be further reduced to 0.038 nm and 0.06 am, respectively. Atom force microscopy （AFM） analysis shows that the final polished surfaces are ultra-smooth without micro-defects.
基金National Natural Science Foundation of China(No. 50390061).
文摘For the purpose of solving the problem that too large pole tip recession （PTR） is produced in magnetic rigid disk heads by mechanical polishing, a chemical mechanical nano-grinding experiment is performed by using a float-piece polisher with a tin plate to achieve a more plane and smoother surface. A basal solution, addition agents and a range of pH value are suitably selected to find a kind of slurry, with which the PTR can be controlled on sub-nanometer scale and the giant magnetic resistance （GMR） corrosion and electrostatic damage （ESD） can be avoided. Moreover, the cause that TiC protrudes from the substrate surface of the heads is studied. The appropriate shape and size of diamond abrasive are selected according to the chemical activation of A1203 and TiC in the same slurry. In this way, the chemical and mechanical interactions are optimized and the optimal surface that has small PTR and TiC asperity is achieved. Ultimatily, the chemical mechanical nano-grinding in combination with mechanical nano-grinding is adopted. Sub-nanometer PTR is achieved and the TiC asperity is eliminated by the chemical mechanical nano-grinding with large size ofmonocrystalline followed by mechanical nano-grinding with smalle polycrystalline diamonds.
文摘On the basis of analysing the character of granite and its polishing technology, the authors have manufactured a kind of polishing disk to polish granite and good results have been obtained. Through studying the polishing process of granite in theory and experiment, the authors think that the high glossiness surface is the result of grinding of abrasives and adhering of soft metal. Moreover, orthogonal test is carried out about the technical parameters for threee typical kinds of granites and some useful results for production are obtained.
