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H-plasma-assisted aluminum induced crystallization of amorphous silicon
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作者 李娟 刘宁 +3 位作者 罗翀 孟志国 熊绍珍 Hoi Sing Kwok 《Journal of Semiconductors》 EI CAS CSCD 2012年第6期125-128,共4页
A technique to improve and accelerate aluminum induced crystallization(AIC) by using hydrogen plasma is proposed.Raman spectroscopy and secondary ion mass spectrometry of crystallized poly-Si thin films show that hy... A technique to improve and accelerate aluminum induced crystallization(AIC) by using hydrogen plasma is proposed.Raman spectroscopy and secondary ion mass spectrometry of crystallized poly-Si thin films show that hydrogen plasma radicals reduce the crystallization time of AIC.This technique shortens the annealing time from 10 to 4 h and increases the Hall mobility from 22.1 to 42.5 cm^2/(V·s).The possible mechanism of AIC assisted by hydrogen radicals is also discussed. 展开更多
关键词 poly-silicon h-plasma aluminum induced crystallization
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