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MECHANICAL DEFLECTION OF POLYSILICON MICROCANTILEVER BEAMS USING NANOINDENTATION 被引量:1
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作者 Ding Jianning Meng Yonggang Wen Shizhu (The National Tribology laboratory, Qinghua University) 《Chinese Journal of Mechanical Engineering》 SCIE EI CAS CSCD 2000年第4期251-257,共7页
The validity of a novel, direct and convenient method for micromechanical property measurements by beam bending using a nanoindenter is demonstrated. This method combines a very high load resolution with a nanometric ... The validity of a novel, direct and convenient method for micromechanical property measurements by beam bending using a nanoindenter is demonstrated. This method combines a very high load resolution with a nanometric precision in the determination of the microcantilever beam deflection. The method is described clearly. In the deflection of microbeams, the influence of the indenter tip pushing into the top of the microbeams and the curvature across its width must be considered. The measurements were made on single-layer, micro-thick, several kinds of width and length polysilicon beams that were fabricated using conventional integrated circuit (IC) fabrication techniques. The elastic of a polysilicon microcantilever beam will vary linearly with the force and the deformation is thought to be elastic. Furthermore, it suggests that Young modulus of the beam can be determined from the slope of this linear relation. From the load deflection data acquired during bending the mechanical properties of the thin films were determined. Measured Young modulus is 137 GPa with approximately a ±2.9%~±6.3% difference in Young modulus. 展开更多
关键词 Mechanical properties Micromechanical devices Thin films polysilicon Nanoindentation
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Organic field-effect transistor floating-gate memory using polysilicon as charge trapping layer
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作者 张文婷 王粉霞 +2 位作者 李玉苗 郭小星 杨建红 《Chinese Physics B》 SCIE EI CAS CSCD 2019年第8期282-286,共5页
In this study,we present an organic field-effect transistor floating-gate memory using polysilicon(poly-Si)as a charge trapping layer.The memory device is fabricated on a N^+-Si/SiO2 substrate.Poly-Si,polymethylmethac... In this study,we present an organic field-effect transistor floating-gate memory using polysilicon(poly-Si)as a charge trapping layer.The memory device is fabricated on a N^+-Si/SiO2 substrate.Poly-Si,polymethylmethacrylate,and pentacene are used as a floating-gate layer,tunneling layer,and active layer,respectively.The device shows bidirectional storage characteristics under the action of programming/erasing(P/E)operation due to the supplied electrons and holes in the channel and the bidirectional charge trapping characteristic of the poly-Si floating-gate.The carrier mobility and switching current ratio(Ion/Ioff ratio)of the device with a tunneling layer thickness of 85 nm are 0.01 cm^2·V^-1·s^-1 and 102,respectively.A large memory window of 9.28 V can be obtained under a P/E voltage of±60 V. 展开更多
关键词 organic FLOATING-GATE MEMORY polysilicon FLOATING-GATE MEMORY WINDOW
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MODEL AND MODELING OF LOW TEMPERATURE CURRENT GAIN OF POLYSILICON EMITTER BIPOLAR TRANSISTORS
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作者 黄流兴 魏同立 +1 位作者 郑茳 曹俊诚 《Journal of Electronics(China)》 1994年第3期277-283,共7页
A unified model of low temperature current gain of polysilicon emitter bipolar transistors based on effective recombination method is presented, incorporating band-gap narrowing, carrier freezing-out, tunneling of hol... A unified model of low temperature current gain of polysilicon emitter bipolar transistors based on effective recombination method is presented, incorporating band-gap narrowing, carrier freezing-out, tunneling of holes through polysilicon/silicon interface oxide layer and reduced mobility mechanism in polysilicon. The modeling results based on this model are in good agreement with experimental data. 展开更多
关键词 BIPOLAR TRANSISTOR polysilicon EMITTER CURRENT GAIN Low temperature
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Science Letters:A robust polysilicon-assisted SCR in ESD protection application 被引量:4
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作者 CUI Qiang HAN Yan +1 位作者 DONG Shu-rong LIOU Juin-jie 《Journal of Zhejiang University-Science A(Applied Physics & Engineering)》 SCIE EI CAS CSCD 2007年第12期1879-1883,共5页
A novel polysilicon-assisted silicon-controlled rectifier (SCR) is presented and analyzed in this paper, which is fabricated in HHNEC's 0.18 μm EEPROM process. The polysilicon-assisted SCRs take advantage of poly... A novel polysilicon-assisted silicon-controlled rectifier (SCR) is presented and analyzed in this paper, which is fabricated in HHNEC's 0.18 μm EEPROM process. The polysilicon-assisted SCRs take advantage of polysilicon layer to help bypass electro-static discharge (ESD) current without occupying extra layout area. TLP current-voltage (I-V) measurement results show that given the same layout areas, robustness performance of polysilicon-assisted SCRs can be improved to 3 times of con- ventional MLSCR's. Moreover, one-finger such polysilicon-assisted SCRs, which occupy only 947 μm2 layout area, can undergo 7-kV HBM ESD stress. Results further demonstrate that the S-type I-V characteristics of polysilicon-assisted SCRs are adjustable to different operating conditions by changing the device dimensions. Compared with traditional SCRs, this new SCR can bypass more ESD currents and consumes smaller IC area. 展开更多
关键词 多晶硅 保护程序 微电子学 电子元件
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Numerical simulation of chemical vapor deposition reaction in polysilicon reduction furnace 被引量:1
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作者 夏小霞 王志奇 刘斌 《Journal of Central South University》 SCIE EI CAS CSCD 2016年第1期44-51,共8页
Three-dimensional model of chemical vapor deposition reaction in polysilicon reduction furnace was established by considering mass, momentum and energy transfer simultaneously. Then, CFD software was used to simulate ... Three-dimensional model of chemical vapor deposition reaction in polysilicon reduction furnace was established by considering mass, momentum and energy transfer simultaneously. Then, CFD software was used to simulate the flow, heat transfer and chemical reaction process in reduction furnace and to analyze the change law of deposition characteristic along with the H_2 mole fraction, silicon rod height and silicon rod diameter. The results show that with the increase of H_2 mole fraction, silicon growth rate increases firstly and then decreases. On the contrary, SiHCl_3 conversion rate and unit energy consumption decrease firstly and then increase. Silicon production rate increases constantly. The optimal H_2 mole fraction is 0.8-0.85. With the growth of silicon rod height, Si HCl3 conversion rate, silicon production rate and silicon growth rate increase, while unit energy consumption decreases. In terms of chemical reaction, the higher the silicon rod is, the better the performance is. In the view of the top-heavy situation, the actual silicon rod height is limited to be below 3 m. With the increase of silicon rod diameter, silicon growth rate decreases firstly and then increases. Besides, SiHCl_3 conversion rate and silicon production rate increase, while unit energy consumption first decreases sharply, then becomes steady. In practice, the bigger silicon rod diameter is more suitable. The optimal silicon rod diameter must be over 120 mm. 展开更多
关键词 多晶硅 沉积反应 化学气相 还原炉 数值模拟 炉内 化学反应过程 摩尔分数
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The Antioxidation Properties of the In-situ Ceramic from Pyrolyzing Polysilicone Preceramic
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作者 宋仁义 《Journal of Wuhan University of Technology(Materials Science)》 SCIE EI CAS 2005年第2期123-126,共4页
A systematic research on the pyrolysis process of polymethysilicone (SAR-2) and the thermostability of the pyrolysis residue was made by the thermogravimetric analysis, DTA and infrared spectroscopy.The experimental... A systematic research on the pyrolysis process of polymethysilicone (SAR-2) and the thermostability of the pyrolysis residue was made by the thermogravimetric analysis, DTA and infrared spectroscopy.The experimental results indicate that the pyrolysis residue of SAR-2 converted into the amorphous SiCxO4-x phase above 900 ℃,the residue at 1200 ℃ is the most thermostable and antioxidant.It is suitable to be used as polysilicone preceramic. 展开更多
关键词 有机硅聚合物 陶瓷 抗氧化性 热解
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Polysilicon Prepared from SiCl_4 by Atmospheric-Pressure Non-Thermal Plasma
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作者 李小松 王楠 +2 位作者 杨晋华 王友年 朱爱民 《Plasma Science and Technology》 SCIE EI CAS CSCD 2011年第5期567-570,共4页
Non-thermal plasma at atmospheric pressure was explored for the preparation ofpolysilicon from SiCl4.The power supply sources of positive pulse and alternating current (8 kHzand 100 kHz) were compared for polysilico... Non-thermal plasma at atmospheric pressure was explored for the preparation ofpolysilicon from SiCl4.The power supply sources of positive pulse and alternating current (8 kHzand 100 kHz) were compared for polysilicon preparation.The samples prepared by using the100 kHz power source were crystalline silicon.The effects of H2 and SiCl4 volume fractions wereinvestigated.The optical emission spectra showed that silicon species played an important role inpolysilicon 展开更多
关键词 非热等离子体 多晶硅 制备 常压 四氯化硅 脉冲电源 大气压力 体积分数
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Numerical simulation study of organic nonvolatile memory with polysilicon floating gate
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作者 闫兆文 王娇 +4 位作者 乔坚栗 谌文杰 杨盼 肖彤 杨建红 《Chinese Physics B》 SCIE EI CAS CSCD 2016年第6期383-389,共7页
A polysilicon-based organic nonvolatile floating-gate memory device with a bottom-gate top-contact configuration is investigated,in which polysilicon is sandwiched between oxide layers as a floating gate.Simulations f... A polysilicon-based organic nonvolatile floating-gate memory device with a bottom-gate top-contact configuration is investigated,in which polysilicon is sandwiched between oxide layers as a floating gate.Simulations for the electrical characteristics of the polysilicon floating gate-based memory device are performed.The shifted transfer characteristics and corresponding charge trapping mechanisms during programing and erasing(P/E) operations at various P/E voltages are discussed.The simulated results show that present memory exhibits a large memory window of 57.5 V,and a high read current on/off ratio of ≈ 10~3.Compared with the reported experimental results,these simulated results indicate that the polysilicon floating gate based memory device demonstrates remarkable memory effects,which shows great promise in device designing and practical application. 展开更多
关键词 非易失性存储器 数值模拟 多晶硅 浮栅 存储器件 接触结构 记忆效应 器件设计
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THE SURFACE EFFECT ON THE TENSILE STRENGTH OF MICROMACHINED POLYSILICON FILMS FOR MEMS
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作者 DingJianning YangJichang WenShizhu 《Acta Mechanica Solida Sinica》 SCIE EI 2005年第1期52-56,共5页
In order to accomplish reliable mechanical design of MEMS, the infuences of surface roughness and octadecyltrichlorosilane (OTS) self-assembled monolayers (SAMs) on the mechani- cal properties of micromachined polysil... In order to accomplish reliable mechanical design of MEMS, the infuences of surface roughness and octadecyltrichlorosilane (OTS) self-assembled monolayers (SAMs) on the mechani- cal properties of micromachined polysilicon flms for MEMS are investigated. Surface efect on the fracture properties of micromachined polysilicon flms is evaluated with a new microtensile testing method using a magnet-coil force actuator. Statistical analysis of the surface roughness efects on the tensile strength predicated the surface roughness characterization of polysilicon flms being tested and the direct relation of the mechanical properties with the surface roughness features. The fracture strength decreases with the increase of the surface roughness. The octadecyltrichlorosi- lane self-assembled monolayers coating leads to an increase of the average fracture strength up to 32.46%. Surface roughness and the hydrophobic properties of specimen when coated with OTS flms are the two main factors infuencing the tensile strength of micromachined polysilicon flms for MEMS. 展开更多
关键词 多硅晶体 表面效应 粗糙度 力学性质 自安装单层 薄膜物理学
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SIZE EFFECT ON THE BENDING AND TENSILE STRENGTH OF MICROMACHINED POLYSILICON FILMS FOR MEMS
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作者 DingJianning YangJichang WenShizhu 《Acta Mechanica Solida Sinica》 SCIE EI 2004年第3期203-208,共6页
The bending strength of microfabricated polysilicon beams was measured by beam bending using a nanoindenter. Also, the tensile strength of microfabricated polysilicon thin ?lms was measured by tensile testing with a n... The bending strength of microfabricated polysilicon beams was measured by beam bending using a nanoindenter. Also, the tensile strength of microfabricated polysilicon thin ?lms was measured by tensile testing with a new microtensile test device. It was found that the bending strength and tensile strength of polysilicon microstructures exerts size e?ect on the size of the specimens. In such cases, the size e?ect can be traced back to the ratio of surface area to volume as the governing parameter. A statistical analysis of the bending strength for various specimen sizes shows that the average bending strength of polysilicon microcantilever beams is 2.885 ± 0.408 GPa. The measured average value of Young’s modulus, 164 ± 1.2 GPa, falls within the theoretical bounds. The average fracture tensile strength is 1.36 GPa with a standard deviation of 0.14 GPa, and the Weibull modulus is 10.4 -11.7, respectively. The tensile testing of 40 specimens on failure results in a recommendation for design that the nominal strain be maintained below 0.0057. 展开更多
关键词 多晶硅薄膜 张力强度 弯曲强度 应变分析
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Numerical simulation of granular silicon growth and silicon fines formation process in polysilicon fluidized bed
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作者 Guangkai Gu Guoqiang Lv +2 位作者 Wenhui Ma Shanlin Du Boqiang Fu 《Particuology》 SCIE EI CAS CSCD 2024年第4期74-86,共13页
Operating conditions strongly affect the yield and quality of polysilicon in a polysilicon fluidized bed.In this study,a new model of polysilicon fluidized bed was established using the Euler-Euler model coupled with ... Operating conditions strongly affect the yield and quality of polysilicon in a polysilicon fluidized bed.In this study,a new model of polysilicon fluidized bed was established using the Euler-Euler model coupled with population balance model(PBM),which was combined with fluid flow,heat,and mass transfer models,while considering the scavenging effect of silicon fines.The effects of different operating conditions on the deposition and formation rates of silicon fines were investigated.Results show that the model can correctly describe the particle growth process in the fluidized bed of polysilicon.The silicon fines and the interphase velocity difference show"N"-and"M"-shaped distributions along the axial direction,respectively.The particle temperature and concentration near the wall are higher than those in the central region.The decomposition of silane in the bottom region of the bed is dominated by het-erogeneous deposition.The scavenging of silicon fines occurs in the dilute-phase region.The effects of operating conditions,i.e.inlet gas temperature,silane composition,and gas velocity,on the reactor performance were also explored comprehensively.Increasing the inlet gas composition and velocity enhances the formation rates of solid silicon and fines.Increasing the inlet gas temperature promotes the growth of solid silicon and inhibits the formation of silicon fines.High fluidization ratio,low inlet silane concentration,and high inlet gas temperature enhance the selectivity of silicon growth. 展开更多
关键词 polysilicon fluidized bed Particle growth Fines CFD Population balance model(PBM)
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多晶硅装置尾气回收工艺研究进展
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作者 杜盼 陈锦溢 +4 位作者 丁哲 陆平 华超 白芳 王繁 《现代化工》 CAS CSCD 北大核心 2024年第4期70-74,共5页
综述了改良西门子法多晶硅制备工艺及尾气回收研究现状,从回收率、回收效果及能耗等方面阐述了湿法回收、膜分离回收和干法回收3种尾气回收工艺。重点概述了多晶硅尾气干法回收工艺各个单元的研究进展,并根据现状总结了未来的研究方向。
关键词 多晶硅 尾气回收 氯硅烷 膜分离
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乙酸改性γ-Al_(2)O_(3)高效去除痕量PCl_(3)的研究
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作者 黄鹏兵 袁威 +3 位作者 王雪莹 王悦 张建树 邓人攀 《石河子大学学报(自然科学版)》 CAS 北大核心 2024年第2期133-139,共7页
在多晶硅生产过程中,为了不影响产品性能,必须将杂质PCl_(3)的含量降低到ppb的水平,然而,这目前仍旧是一个巨大的挑战。本研究提出了一种可高效去除痕量PC13的方法,即利用乙酸改性γ-Al_(2)O_(3)作为吸附剂,其可去除ppb级别的PCl_(3),... 在多晶硅生产过程中,为了不影响产品性能,必须将杂质PCl_(3)的含量降低到ppb的水平,然而,这目前仍旧是一个巨大的挑战。本研究提出了一种可高效去除痕量PC13的方法,即利用乙酸改性γ-Al_(2)O_(3)作为吸附剂,其可去除ppb级别的PCl_(3),去除率高达84.2%。Boehm滴定实验表明,改性后的γ-Al_(2)O_(3)表面羧基含量大幅增加,从而增加了吸附PCl_(3)的活性位点,使其对PCl_(3)的吸附性能显著提升。表征分析和DFT模拟计算表明,乙酸与γ-Al_(2)O_(3)主要是通过γ-Al_(2)O_(3)中的羟基H和乙酸中的羰基O形成氢键而相互作用的;除了物理吸附外,γ-Al_(2)O_(3)中的Al与PCl_(3)中的Cl,以及乙酸中的羰基O与PCl_(3)中的P之间还可通过电荷转移相互作用。连续五次循环实验表明,该吸附剂在低温下具有优异的再生性能。本研究开发的吸附剂由于其高效、易于再生和低成本等特点,在去除痕量PCl_(3)方面具有潜在的应用前景。 展开更多
关键词 γ-Al_(2)O_(3) 乙酸 吸附 痕量PCl_(3) 多晶硅
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Scale dependence of tensile strength of micromachined polysilicon MEMS structures due to microstructural and dimensional constraints 被引量:2
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作者 Ding, JN Meng, YG Wen, SH 《Chinese Science Bulletin》 SCIE EI CAS 2001年第16期1392-1397,共6页
The success of microelectromechanical systems (MEMS) as a key technology in the 21st century depends in no small part on the solution of materials issues associated with the design and fabrication of complex MEMS devi... The success of microelectromechanical systems (MEMS) as a key technology in the 21st century depends in no small part on the solution of materials issues associated with the design and fabrication of complex MEMS devices. The reliable mechanical properties of these thin films are critical to the safety and functioning of these microdevices and should be accurately determined. In order to accomplish a reliable mechanical design of MEMS, a new microtensile test device using a magnetic-solenoid force actuator was developed to evaluate the mechanical properties of microfabricated polysilicon thin films with dimensions of 100—660 mm length, 20—200 mm width, and 2.4 mm thickness. It was found that the measured average value of Young抯 modulus, 164±1.2 GPa, falls within the theoretical bounds. The average fracture strength is 1.36 GPa with a standarddeviation of 0.14 GPa, and the Weibull modulus is 10.4—11.7, respectively. Statistical analysis of the specimen size effect on the tensile strength predicated the size effect on the length, the surface area and the volume of the specimens due tomicrostructural and dimensional constraints. The fracturestrength increases with the increase of the ratio of surfacearea to volume. In such cases the size effect can be tracedback to the ratio of surface area to volume as the governing parameter. The test data account for the uncertainties inmechanical properties and may be used in the future reliability design of polysilicon MEMS. The testing of 40specimens to failure results in a recommendation for design that the nominal strain be maintained below 0.0057. 展开更多
关键词 microelectromechanical systems polysilicon elasticmodulus TENSILE STRENGTH SIZE effect.
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超高效液相色谱法测定化妆品中聚硅氧烷-15等7种脂溶性防晒剂的含量
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作者 郭珊珊 简育莹 +2 位作者 卓婧 陈硕 卢端萍 《分析科学学报》 CAS CSCD 北大核心 2024年第1期43-49,共7页
建立了一种超高效液相色谱法测定聚硅氧烷-15等7种脂溶性防晒剂含量的方法,样品使用乙醇-四氢呋喃(体积比3∶1)混合溶剂超声提取,经Waters Symmetry C18(150×4.6 mm,3.5μm)色谱柱分离,以异丙醇-四氢呋喃(体积比90∶10)-水为流动... 建立了一种超高效液相色谱法测定聚硅氧烷-15等7种脂溶性防晒剂含量的方法,样品使用乙醇-四氢呋喃(体积比3∶1)混合溶剂超声提取,经Waters Symmetry C18(150×4.6 mm,3.5μm)色谱柱分离,以异丙醇-四氢呋喃(体积比90∶10)-水为流动相进行梯度洗脱,流速0.7 mL/min,柱温为25℃,检测波长311 nm。结果表明,7种脂溶性防晒剂在相应的质量浓度范围内线性关系良好(r≥0.9999),不同基质类型的样品在低、中、高3个浓度水平的平均加标回收率为94.4%~103.0%,相对标准偏差为0.4%~4.4%,检出限和定量限范围分别为0.002%~0.009%和0.005%~0.03%,各成分在48 h内稳定。采用该方法测定市售30批化妆品中的防晒剂,测定结果与《化妆品安全技术规范》(2015版)方法相比,检出的亚甲基双-苯并三唑基四甲基丁基酚、双-乙基己氧苯酚甲氧苯基三嗪等脂溶性防晒剂提取效果优于《规范》方法。该方法准确、快速、灵敏度高、稳定性好,可用于化妆品中脂溶性防晒剂的测定。 展开更多
关键词 超高效液相色谱法 化妆品 聚硅氧烷-15 三联苯基三嗪 防晒剂
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多晶硅安全生产风险分析和事故预防
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作者 李振宁 张前喜 《煤化工》 CAS 2024年第1期88-91,共4页
随着光伏产业的迅猛发展,主要生产原料多晶硅的需求增长迅速。国内多晶硅生产以三氯氢硅西门子法为主,硅烷流化床法为辅。介绍了多晶硅行业的发展概况和安全形势,以三氯氢硅西门子法为例分析了多晶硅生产过程的危险性,对行业近年来发生... 随着光伏产业的迅猛发展,主要生产原料多晶硅的需求增长迅速。国内多晶硅生产以三氯氢硅西门子法为主,硅烷流化床法为辅。介绍了多晶硅行业的发展概况和安全形势,以三氯氢硅西门子法为例分析了多晶硅生产过程的危险性,对行业近年来发生的安全生产事故进行了分析,剖析事故形成的原因,提出预防事故发生的措施和建议。 展开更多
关键词 多晶硅 生产 安全 风险 事故 预防
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气相色谱与质谱联用在多晶硅生产上的应用进展
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作者 何孟 吴岷贤 +2 位作者 李剑波 刘涛 吴加勇 《石化技术》 CAS 2024年第1期77-81,共5页
多晶硅是推动国家战略能源结构和新能源产业改革,发展太阳能光伏行业的重要原材料。气相色谱技术以其卓越的分离能力和准确的测量结果,在化学分析领域发挥着至关重要的作用。研究综述了气相色谱技术及气质联用技术在多晶硅分析方面的应... 多晶硅是推动国家战略能源结构和新能源产业改革,发展太阳能光伏行业的重要原材料。气相色谱技术以其卓越的分离能力和准确的测量结果,在化学分析领域发挥着至关重要的作用。研究综述了气相色谱技术及气质联用技术在多晶硅分析方面的应用进展,介绍了气相色谱的分离机理,并结合具体应用实例对气相色谱及质谱联用技术在多晶硅生产中所涉及方面的应用进行了详细阐述。 展开更多
关键词 气相色谱 联用技术 多晶硅 进展
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Casimir Force Correction Between Parallel Polysilicon Plates
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作者 丁建宁 孟永钢 温诗铸 《Tsinghua Science and Technology》 SCIE EI CAS 2002年第3期276-280,共5页
Both the size of the components and the separation between them in some microelectromechanical systems (MEMS) are already in the sub-micrometer regime, where quantum mechanical effects such as the Casimir effect will ... Both the size of the components and the separation between them in some microelectromechanical systems (MEMS) are already in the sub-micrometer regime, where quantum mechanical effects such as the Casimir effect will need to be considered. This paper theoretically analyzes the roughness, electrical conductivity, and temperature corrections due to the Casimir force between two parallel polysilicon plates. The theoretical results show that the combined effects of roughness, conductivity and temperature cause a maximum relative error of the Casimir force per unit area of 26.2% between parallel polysilicon plates separated by 1 μm. Therefore, the surface roughness and finite conductivity corrections should be taken into account when calculating precise Casimir forces with separations on the order of 1 μm. 展开更多
关键词 CASIMIR FORCE polysilicon microelectromechanical system (MEMS)
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Experimental and Theoretical Study of Young Modulus in Micromachined Polysilicon Films
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作者 丁建宁 孟永钢 温诗铸 《Tsinghua Science and Technology》 SCIE EI CAS 2002年第3期270-275,共6页
The elastic modulus is a very important mechanical property in micromachined structures. Several design issues such as resonant frequencies and stiffness in the micromachined structures are related to the elastic modu... The elastic modulus is a very important mechanical property in micromachined structures. Several design issues such as resonant frequencies and stiffness in the micromachined structures are related to the elastic modulus. In addition, the accuracy of results from finite element models is highly dependent upon the elastic modulus. In this study, the Young modulus of micromachined thin polysilicon films has been investigated with a new tensile test machine using a magnetic-solenoid force actuator with linear response, low hysteresis, no friction and direct electrical control. The tensile test results show that the measured average value of Young modulus for a typical sample, (164±1.2) GPa, falls within the theoretical bounds of the texture model. These results will provide more reliable design of polysilicon microelectromechanical systems (MEMS). 展开更多
关键词 YOUNG MODULUS microelectromechanical SYSTEMS (MEMS) polysilicon
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新疆硅基产业绿色低碳发展建议
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作者 冯润 武兵 谢丹 《节能与环保》 2024年第1期76-80,共5页
硅基新材料是以硅为基材制得的新型材料,是发展太阳能光伏产业的基础性材料,也是电子信息、节能环保等战略性新兴产业不可或缺的关键核心材料。本文以新疆地区目前形成的硅基产业为对象,对新疆硅基产业发展现状、能源利用状况等进行分析... 硅基新材料是以硅为基材制得的新型材料,是发展太阳能光伏产业的基础性材料,也是电子信息、节能环保等战略性新兴产业不可或缺的关键核心材料。本文以新疆地区目前形成的硅基产业为对象,对新疆硅基产业发展现状、能源利用状况等进行分析,并提出“双碳”背景下以绿色低碳引领硅基产业高质量发展的政策建议。 展开更多
关键词 工业硅 单晶硅 多晶硅 绿色低碳发展
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