Due to its low electrical loss and low process cost, a glass interposer has been developed to provide a compelling alternative to the silicon-based interposer for packaging of future 2-D and 3-D ICs. In this study,thr...Due to its low electrical loss and low process cost, a glass interposer has been developed to provide a compelling alternative to the silicon-based interposer for packaging of future 2-D and 3-D ICs. In this study,through glass vias(TGVs) are used to implement 3-D inductors for minimal footprint and large quality factor. Using the inductors and parallel plate capacitors, a compact 3-D Wilkinson power divider is designed and analyzed.Compared with some reported power dividers, the proposed TGV-based circuit has an ultra-compact size and excellent electrical performance.展开更多
基金Projected supported by the National Natural Science Foundation of China(Nos.61771268,61571248,U1709218)the Science and Technology Fund of Zhejiang Province(No.2015C31090)+1 种基金the Natural Science Foundation of Zhejiang(No.LY17F040002)the K.C.Wong Magna Fund in Ningbo University
文摘Due to its low electrical loss and low process cost, a glass interposer has been developed to provide a compelling alternative to the silicon-based interposer for packaging of future 2-D and 3-D ICs. In this study,through glass vias(TGVs) are used to implement 3-D inductors for minimal footprint and large quality factor. Using the inductors and parallel plate capacitors, a compact 3-D Wilkinson power divider is designed and analyzed.Compared with some reported power dividers, the proposed TGV-based circuit has an ultra-compact size and excellent electrical performance.
文摘随着摩尔定律的发展迟缓,微电子器件的高密度化、微型化对先进封装技术提出了更高的要求。中介层技术作为2.5D/3D封装中的关键技术,受到了广泛研究。按照中介层材料不同,主要分为有机中介层、硅中介层以及玻璃中介层。与硅通孔(through silicon via,TSV)互连相比,玻璃通孔(through glass via,TGV)中介层(interposer)因其具有优良的高频电学特性、工艺简单、成本低以及可调的热膨胀系数(coefficient of thermal expansion,CTE)等优点,在2.5D/3D先进封装领域受到广泛关注。然而玻璃的导热系数(约1 W·m^(-1)·K^(-1))与硅(约150 W·m^(-1)·K^(-1))相比要低很多,因此玻璃中介层存在着严重的散热问题。为得到高质量的TGV中介层,不仅需要高效低成本的通孔制备工艺,还需要无缺陷的填充工艺,目前玻璃中介层面临的挑战也主要集中在这两方面。本文首先介绍了TGV的制备工艺,如超声波钻孔(ultra-sonic drilling,USD)、超声波高速钻孔(ultra-sonic high speed drilling,USHD)、湿法刻蚀、深反应离子刻蚀(deep reactive ion etching,DRIE)、光敏玻璃、激光刻蚀、激光诱导深度刻蚀(laser induced deep etching,LIDE)等。接着围绕TGV的无缺陷填充进行总结,概述了TGV的几种填充机理以及一些填充工艺,如bottom-up填充、蝶形填充以及conformal填充。然后对TGV电镀添加剂的研究进展进行了介绍,包括典型添加剂的作用机理以及一些新型添加剂的研究现状,最后并对TGV实际应用情况进行了简要综述。
