The Hot Universe Baryon Surveyor (HUBS) mission will carry a nested X-ray telescope capable of observing an energy range from 0.5 keV to 2 keV to study hot baryon evolution. In this paper, we report the latest progres...The Hot Universe Baryon Surveyor (HUBS) mission will carry a nested X-ray telescope capable of observing an energy range from 0.5 keV to 2 keV to study hot baryon evolution. In this paper, we report the latest progress in the design and construction of nested X-ray telescopes which were designed to use a three-stage conic-approximation type assembly to simplify the manufacturing process. The mirror substrate is made using the thermal glass slumping method, with mirrors characterized by a root-mean-square roughness of 0.3 nm, with expected high reflectivity and good thermal stability. We also discuss methods of telescope construction and conduct a deformation analysis of the manufactured mirror. The in situ measurement system program is developed to guide the telescope assembly process.展开更多
Chromium atom photolithography gratings are a promising technology for the development of nanoscale length standard substances due to their high accuracy,uniformity,and consistency.However,the inherent difference betw...Chromium atom photolithography gratings are a promising technology for the development of nanoscale length standard substances due to their high accuracy,uniformity,and consistency.However,the inherent difference between the interaction of positive and negative frequency detuning standing wave field and the atoms can cause a difference in the adjacent peak-to-valley heights of the grating in positive and negative frequency detuning chromium atom lithography,which greatly reduces its accuracy.In this study,we performed a controlled variable growth simulation using the semi-classical theoretical model and Monte Carlo method with trajectory tracking and ballistic deposition methods to investigate the influence of key experimental parameters on the surface growth process of positive and negative frequency detuning atomic lithography gratings.We established a theoretical model based on simulation results and summarized empirical equations to guide the selection of experimental parameters.Our simulations achieved uniform positive and negative frequency detuning atomic lithography gratings with a period of 1/4 of the wavelength corresponding to the atomic transition frequency,and adjacent peak-to-valley heights differing by no more than 2 nm,providing an important theoretical reference for the controllable fabrication of these gratings.展开更多
The X-ray low angle reflectivity measurement is used to investigate single and bilayer films to determine the parameters of nanometer-scale structures,three effectual methods are presented by using X-ray reflectivity ...The X-ray low angle reflectivity measurement is used to investigate single and bilayer films to determine the parameters of nanometer-scale structures,three effectual methods are presented by using X-ray reflectivity analysis to provide an accurate estimation of the nanometer film structures. The parameters of tungsten (W) single layer, such as the material density, interface roughness and deposition rate, were obtained easily and speedily. The base metal layer was introduced to measure the profiles of single low Z material film. A 0.3 nm chromium (Cr) film was also studied by low angle reflectivity analysis.展开更多
Refractive index inhomogeneity is one of the important characteristics of optical coating material, which is one of the key factors to produce loss to the ultra-low residual reflection coatings except using the refrac...Refractive index inhomogeneity is one of the important characteristics of optical coating material, which is one of the key factors to produce loss to the ultra-low residual reflection coatings except using the refractive index inhomogeneity to obtain gradient-index coating. In the normal structure of antireflection coatings for center wavelength at 532 nm, the physical thicknesses of layer H and layer L are 22.18 nm and 118.86 nm, respectively. The residual reflectance caused by refractive index inhomogeneity（the degree of inhomogeneous is between -0.2 and 0.2） is about 200 ppm, and the minimum reflectivity wavelength is between 528.2 nm and 535.2 nm. A new numerical method adding the refractive index inhomogeneity to the spectra calculation was proposed to design the laser antireflection coatings, which can achieve the design of antireflection coatings with ppm residual reflection by adjusting physical thickness of the couple layers. When the degree of refractive index inhomogeneity of the layer H and layer L is-0.08 and 0.05 respectively, the residual reflectance increase from zero to 0.0769% at 532 nm. According to the above accuracy numerical method, if layer H physical thickness increases by 1.30 nm and layer L decrease by 4.50 nm, residual reflectance of thin film will achieve to 2.06 ppm. When the degree of refractive index inhomogeneity of the layer H and layer L is 0.08 and -0.05 respectively, the residual reflectance increase from zero to 0.0784% at 532 nm. The residual reflectance of designed thin film can be reduced to 0.8 ppm by decreasing the layer H of 1.55 nm while increasing the layer L of 4.94 nm.展开更多
We present a new and practical approach for preparing submicro-textured silver and aluminum （Ag/Al） double-structured layers at low substrate temperatures. The surface texturing of silver and aluminum double-structu...We present a new and practical approach for preparing submicro-textured silver and aluminum （Ag/Al） double-structured layers at low substrate temperatures. The surface texturing of silver and aluminum double-structured layers was performed by increasing the deposition temperature of the Al layers to 270℃. The highly submicro-textured silver and aluminum double-structured layers were prepared by thermal evaporation on quartz glasses and their surface microstructure, light scattering properties, and thermal stability were investigated. Results showed that the highly submicro-textured Ag/Al composite films prepared at low substrate temperatures used as back reflectors not only can enhance the light scattering and have good thermal stability, but also have good adhesion properties. In addition, their fabrication is low cost and readily carried out.展开更多
Multilayer polarization elements and their applications to polarimetric studies in 20～400 eV region are mainly reviewed. General principle of selecting material combinations to get high linear polarizance multilayers...Multilayer polarization elements and their applications to polarimetric studies in 20～400 eV region are mainly reviewed. General principle of selecting material combinations to get high linear polarizance multilayers of reflection type is given with practical examples,with periodic or non-periodic layer structures depending on the usage. Transmission type is introduced as linear polarizer and phase shifter. Their applications include polarization diagnosis of laboratory optical systems and synchrotron radiation beamlines of linear and circular polarization,magnetic rotation experiments such as Faraday rotation and magnetic Kerr rotation on magnetic films and multilayers,and ellipsometry to measure optical constants of thin films precisely. Polarization analysis of soft X-ray fluorescence using multilayer-coated grating is also mentioned. Finally this review is summarized with outlook of further developments.展开更多
Intrinsic stresses of carbon films deposited by direct current （DC） magnetron sputtering were investigated. The bombardments of energetic particles during the growth of films were considered to be the main reason fo...Intrinsic stresses of carbon films deposited by direct current （DC） magnetron sputtering were investigated. The bombardments of energetic particles during the growth of films were considered to be the main reason for compressive intrinsic stresses. The values of intrinsic stresses were determined by measuring the radius of curvature of substrates before and after film deposition. By varying argon pressure and target-substrate distance, energies of neutral carbon atoms impinging on the growing films were optimized to control the intrinsic stresses level. The stress evolution in carbon films as a function of film thickness was investigated and a void-related stress relief mechanism was proposed to interpret this evolution.展开更多
The chirped Mo/Si multilayer mirror in the extreme ultraviolet region is designed to obtain sub-femtosecond pulses from high-order harmonics. Numerical simulations of temporal profile of the pulses are made for superp...The chirped Mo/Si multilayer mirror in the extreme ultraviolet region is designed to obtain sub-femtosecond pulses from high-order harmonics. Numerical simulations of temporal profile of the pulses are made for superposition of incident high-order harmonics and that of reflected ones by the chirped multilayer mirror. The normal incidence reflectivity and chirp in the wavelength range of 12.5 - 16.5 nm are 6.7% =k 0.5% and -3617 ± 171 as^2, respectively. Simulation results indicate that the designed chirped multilayer mirror can be used for producing 104-as pulses.展开更多
The influence of nodule defects on the characteristics of femtosecond laser-induced damage has not been fully investigated.In this study,two types of 800 nm/1064 nm dual-band HfO_(2)=Si O_(2) high-reflection films wit...The influence of nodule defects on the characteristics of femtosecond laser-induced damage has not been fully investigated.In this study,two types of 800 nm/1064 nm dual-band HfO_(2)=Si O_(2) high-reflection films with different configurations were analyzed.Combined with finite-difference time-domain electric field simulation and focused ion beam analysis,the initial state and growth process of femtosecond laser damage of nodules were explored.In particular,the sequence of blister damage determined by the film design and the inner damage caused by nodules were clarified.The rule of the laser-induced damage threshold of different size nodules was obtained.The difference in the damage behavior of nodules in the two types of films was elucidated.展开更多
Ultra-short-period W/C multilayers having periodic thickness range of 1.15-3.01 nm have been fabricated for soft X-ray optics using the high vacuum direct current (DC) magnetron sputtering system. These multilayers we...Ultra-short-period W/C multilayers having periodic thickness range of 1.15-3.01 nm have been fabricated for soft X-ray optics using the high vacuum direct current (DC) magnetron sputtering system. These multilayers were characterized by low-angle X-ray diffraction (LAXRD) and transmission electron microscope (TEM). The results show that the multilayer thin films with periodic thickness more than 1.5 nm have clear W-C interface and low roughness. But the structure of the periodic thickness below 1.5 nm is not clear. Finally, three ways to improve the performance of the multilayers are suggested.展开更多
Light scattering properties of back grating structures that composed of one-dimensional ZnO gratings and a flat 300-nm A1 reflectors are investigated. Results show that grating structures cause an 8% reduction of the ...Light scattering properties of back grating structures that composed of one-dimensional ZnO gratings and a flat 300-nm A1 reflectors are investigated. Results show that grating structures cause an 8% reduction of the total reflectivity, as grating periods increasing from 620 to 1435 nm, both the diffuse reflectivity and the haze parameter enhance drastically between 400 and 1 000 nm, whereas the diffraction angle at normal incidence reduce greatly, which agree with the values calculated from grating equation. It is concluded that rear gratings have the potential of scattering a substantial amount of incident light to specific angles and enlarging the optical path.展开更多
Dual-grating structure thin-film silicon solar cells with different front and back grating periodicities are designed The geometrical parameters of both gratings are investigated. The reflection is greatly reduced by ...Dual-grating structure thin-film silicon solar cells with different front and back grating periodicities are designed The geometrical parameters of both gratings are investigated. The reflection is greatly reduced by the front grating, whereas the absorption in the long wavelength is increased because of the back grating. The short circuit current of the combined structure is enhanced by 16.8% for a 1μm thick c-Si layer compared with that of the conformal grating structure. The short circuit current can be further increased by creating a relative lateral displacement between the front and back gratings. The displacement results in a more remarkably enhaneed absorption when the thickness of the aetive layer is reduced, indicating its importance in the design of ultra-thin high-efficiency solar cells.展开更多
A bandpass filter with twin wideband channels in a single-layer guided-mode resonance grating is presented. Strong refractive-index modulation is used to support the excitation of multimode resonances TEl,0, TEl,l, TE...A bandpass filter with twin wideband channels in a single-layer guided-mode resonance grating is presented. Strong refractive-index modulation is used to support the excitation of multimode resonances TEl,0, TEl,l, TE2,0, TEl,2, and TE2,1, which are excited by the first and second diffraction orders, relate asymmetrical line shapes and broad low-transmission bands, where TE is the transverse electric. Taking advantage of narrow linewidth and sharp edge line shape in the spectra of TE2,, （v is the mode）, a bandpass filter with form factors of 0.61 and 0.7 for long- and short-wave channels is presented to demonstrate this concept.展开更多
In this letter, a design with both metal nanoparticles and back diffraction gratings is put forward for enhancing the efficiency of thin film silicon solar cells. The coupling mechanism between the metal nanoparticles...In this letter, a design with both metal nanoparticles and back diffraction gratings is put forward for enhancing the efficiency of thin film silicon solar cells. The coupling mechanism between the metal nanoparticles and silicon absorber layer, and that between the incident light and the modes of the silicon absorption layer through the grating layer are both analyzed. The interaction between the front metal nanoparticles and back gratings is analyzed, which substantially increases the light trapping by 58% com- pared to fiat solar cell.展开更多
基金supported by National Key R&D Program of China (2022YFF0709101)China National Space Administration (D050104)National Natural Science Foundation of China (62105244 and U2030111)。
文摘The Hot Universe Baryon Surveyor (HUBS) mission will carry a nested X-ray telescope capable of observing an energy range from 0.5 keV to 2 keV to study hot baryon evolution. In this paper, we report the latest progress in the design and construction of nested X-ray telescopes which were designed to use a three-stage conic-approximation type assembly to simplify the manufacturing process. The mirror substrate is made using the thermal glass slumping method, with mirrors characterized by a root-mean-square roughness of 0.3 nm, with expected high reflectivity and good thermal stability. We also discuss methods of telescope construction and conduct a deformation analysis of the manufactured mirror. The in situ measurement system program is developed to guide the telescope assembly process.
基金Project supported by the National Natural Science Foundation of China(Grant No.62075165)the National Key Research and Development Program of China(Grant Nos.2022YFF0607600 and 2022YFF0605502)+3 种基金the Special Development Funds for Major Projects of Shanghai Zhangjiang National Independent Innovation Demonstration Zone(Grant No.ZJ2021ZD008)the Shanghai Natural Science Foundation(Grant No.21ZR1483100)the Shanghai Academic/Technology Research Leader(Grant No.21XD1425000)the Opening Fund of Shanghai Key Laboratory of Online Detection and Control Technology(Grant No.ZX2020101)。
文摘Chromium atom photolithography gratings are a promising technology for the development of nanoscale length standard substances due to their high accuracy,uniformity,and consistency.However,the inherent difference between the interaction of positive and negative frequency detuning standing wave field and the atoms can cause a difference in the adjacent peak-to-valley heights of the grating in positive and negative frequency detuning chromium atom lithography,which greatly reduces its accuracy.In this study,we performed a controlled variable growth simulation using the semi-classical theoretical model and Monte Carlo method with trajectory tracking and ballistic deposition methods to investigate the influence of key experimental parameters on the surface growth process of positive and negative frequency detuning atomic lithography gratings.We established a theoretical model based on simulation results and summarized empirical equations to guide the selection of experimental parameters.Our simulations achieved uniform positive and negative frequency detuning atomic lithography gratings with a period of 1/4 of the wavelength corresponding to the atomic transition frequency,and adjacent peak-to-valley heights differing by no more than 2 nm,providing an important theoretical reference for the controllable fabrication of these gratings.
基金This work was supported by the National Natural Science Foun-dation of China(10435050,60378021)the National 863-804Sustentation Fund(2006AA12Z139)+2 种基金the Program for New Cen-tury Excellent Talents in University(NCET-04-037)the RoyalSociety,London(NC/China/16660)Tongji University scien-tific fund.
文摘The X-ray low angle reflectivity measurement is used to investigate single and bilayer films to determine the parameters of nanometer-scale structures,three effectual methods are presented by using X-ray reflectivity analysis to provide an accurate estimation of the nanometer film structures. The parameters of tungsten (W) single layer, such as the material density, interface roughness and deposition rate, were obtained easily and speedily. The base metal layer was introduced to measure the profiles of single low Z material film. A 0.3 nm chromium (Cr) film was also studied by low angle reflectivity analysis.
基金Project supported by the National Natural Science Foundation of China(Grant Nos.61405145 and 61235011)the Natural Science Foundation of Tianjin,China(Grant No.15JCZDJC31900)the China Postdoctoral Science Foundation(Grant Nos.2015T80115 and 2014M560104)
文摘Refractive index inhomogeneity is one of the important characteristics of optical coating material, which is one of the key factors to produce loss to the ultra-low residual reflection coatings except using the refractive index inhomogeneity to obtain gradient-index coating. In the normal structure of antireflection coatings for center wavelength at 532 nm, the physical thicknesses of layer H and layer L are 22.18 nm and 118.86 nm, respectively. The residual reflectance caused by refractive index inhomogeneity（the degree of inhomogeneous is between -0.2 and 0.2） is about 200 ppm, and the minimum reflectivity wavelength is between 528.2 nm and 535.2 nm. A new numerical method adding the refractive index inhomogeneity to the spectra calculation was proposed to design the laser antireflection coatings, which can achieve the design of antireflection coatings with ppm residual reflection by adjusting physical thickness of the couple layers. When the degree of refractive index inhomogeneity of the layer H and layer L is-0.08 and 0.05 respectively, the residual reflectance increase from zero to 0.0769% at 532 nm. According to the above accuracy numerical method, if layer H physical thickness increases by 1.30 nm and layer L decrease by 4.50 nm, residual reflectance of thin film will achieve to 2.06 ppm. When the degree of refractive index inhomogeneity of the layer H and layer L is 0.08 and -0.05 respectively, the residual reflectance increase from zero to 0.0784% at 532 nm. The residual reflectance of designed thin film can be reduced to 0.8 ppm by decreasing the layer H of 1.55 nm while increasing the layer L of 4.94 nm.
基金the National Natural Science Foundation of China(Grant No.60977028)the Key Project Foundation of Shanghai,China(Grant No.09JC1413800)
文摘We present a new and practical approach for preparing submicro-textured silver and aluminum （Ag/Al） double-structured layers at low substrate temperatures. The surface texturing of silver and aluminum double-structured layers was performed by increasing the deposition temperature of the Al layers to 270℃. The highly submicro-textured silver and aluminum double-structured layers were prepared by thermal evaporation on quartz glasses and their surface microstructure, light scattering properties, and thermal stability were investigated. Results showed that the highly submicro-textured Ag/Al composite films prepared at low substrate temperatures used as back reflectors not only can enhance the light scattering and have good thermal stability, but also have good adhesion properties. In addition, their fabrication is low cost and readily carried out.
文摘Multilayer polarization elements and their applications to polarimetric studies in 20～400 eV region are mainly reviewed. General principle of selecting material combinations to get high linear polarizance multilayers of reflection type is given with practical examples,with periodic or non-periodic layer structures depending on the usage. Transmission type is introduced as linear polarizer and phase shifter. Their applications include polarization diagnosis of laboratory optical systems and synchrotron radiation beamlines of linear and circular polarization,magnetic rotation experiments such as Faraday rotation and magnetic Kerr rotation on magnetic films and multilayers,and ellipsometry to measure optical constants of thin films precisely. Polarization analysis of soft X-ray fluorescence using multilayer-coated grating is also mentioned. Finally this review is summarized with outlook of further developments.
基金the National Natural Sci-ence Foundation of China (No.10435050,10675092,and 10675091)the"863"Project Plan (No.2006AA12Z139)the Program for New Century Excellent Talents in University (No.NCET-04-0376).
文摘Intrinsic stresses of carbon films deposited by direct current （DC） magnetron sputtering were investigated. The bombardments of energetic particles during the growth of films were considered to be the main reason for compressive intrinsic stresses. The values of intrinsic stresses were determined by measuring the radius of curvature of substrates before and after film deposition. By varying argon pressure and target-substrate distance, energies of neutral carbon atoms impinging on the growing films were optimized to control the intrinsic stresses level. The stress evolution in carbon films as a function of film thickness was investigated and a void-related stress relief mechanism was proposed to interpret this evolution.
基金the National Natural Science Foundation of China under Grant NO.10704056.
文摘The chirped Mo/Si multilayer mirror in the extreme ultraviolet region is designed to obtain sub-femtosecond pulses from high-order harmonics. Numerical simulations of temporal profile of the pulses are made for superposition of incident high-order harmonics and that of reflected ones by the chirped multilayer mirror. The normal incidence reflectivity and chirp in the wavelength range of 12.5 - 16.5 nm are 6.7% =k 0.5% and -3617 ± 171 as^2, respectively. Simulation results indicate that the designed chirped multilayer mirror can be used for producing 104-as pulses.
基金supported by the National Natural Science Foundation of China(Nos.61675156 and 61975153)。
文摘The influence of nodule defects on the characteristics of femtosecond laser-induced damage has not been fully investigated.In this study,two types of 800 nm/1064 nm dual-band HfO_(2)=Si O_(2) high-reflection films with different configurations were analyzed.Combined with finite-difference time-domain electric field simulation and focused ion beam analysis,the initial state and growth process of femtosecond laser damage of nodules were explored.In particular,the sequence of blister damage determined by the film design and the inner damage caused by nodules were clarified.The rule of the laser-induced damage threshold of different size nodules was obtained.The difference in the damage behavior of nodules in the two types of films was elucidated.
基金This work was supported by the National Natural Sci- ence Foundation of China (No. 10435050, 60378021)by the Nanometer Technology Special Founda- tion of Shanghai Science and Technology Commit- tee (No. 0352nm090).
文摘Ultra-short-period W/C multilayers having periodic thickness range of 1.15-3.01 nm have been fabricated for soft X-ray optics using the high vacuum direct current (DC) magnetron sputtering system. These multilayers were characterized by low-angle X-ray diffraction (LAXRD) and transmission electron microscope (TEM). The results show that the multilayer thin films with periodic thickness more than 1.5 nm have clear W-C interface and low roughness. But the structure of the periodic thickness below 1.5 nm is not clear. Finally, three ways to improve the performance of the multilayers are suggested.
文摘Light scattering properties of back grating structures that composed of one-dimensional ZnO gratings and a flat 300-nm A1 reflectors are investigated. Results show that grating structures cause an 8% reduction of the total reflectivity, as grating periods increasing from 620 to 1435 nm, both the diffuse reflectivity and the haze parameter enhance drastically between 400 and 1 000 nm, whereas the diffraction angle at normal incidence reduce greatly, which agree with the values calculated from grating equation. It is concluded that rear gratings have the potential of scattering a substantial amount of incident light to specific angles and enlarging the optical path.
基金supported by the National Natural Science Foundation of China(No.60977028)the Key Project Foundation of Shanghai(No.09JC1413800)
文摘Dual-grating structure thin-film silicon solar cells with different front and back grating periodicities are designed The geometrical parameters of both gratings are investigated. The reflection is greatly reduced by the front grating, whereas the absorption in the long wavelength is increased because of the back grating. The short circuit current of the combined structure is enhanced by 16.8% for a 1μm thick c-Si layer compared with that of the conformal grating structure. The short circuit current can be further increased by creating a relative lateral displacement between the front and back gratings. The displacement results in a more remarkably enhaneed absorption when the thickness of the aetive layer is reduced, indicating its importance in the design of ultra-thin high-efficiency solar cells.
基金supported by the National Natural Science Foundation of China (No. 60977028)the Key Project Foundation of Shanghai (No. 09JC1413800)
文摘A bandpass filter with twin wideband channels in a single-layer guided-mode resonance grating is presented. Strong refractive-index modulation is used to support the excitation of multimode resonances TEl,0, TEl,l, TE2,0, TEl,2, and TE2,1, which are excited by the first and second diffraction orders, relate asymmetrical line shapes and broad low-transmission bands, where TE is the transverse electric. Taking advantage of narrow linewidth and sharp edge line shape in the spectra of TE2,, （v is the mode）, a bandpass filter with form factors of 0.61 and 0.7 for long- and short-wave channels is presented to demonstrate this concept.
文摘In this letter, a design with both metal nanoparticles and back diffraction gratings is put forward for enhancing the efficiency of thin film silicon solar cells. The coupling mechanism between the metal nanoparticles and silicon absorber layer, and that between the incident light and the modes of the silicon absorption layer through the grating layer are both analyzed. The interaction between the front metal nanoparticles and back gratings is analyzed, which substantially increases the light trapping by 58% com- pared to fiat solar cell.
